碳化硼球面薄膜及空心微球的制备

doi:10.3724/SP.J.1077.2012.12091

无机材料学报 ›› 2012, Vol. 27 ›› Issue (12): 1325-1330.DOI: 10.3724/SP.J.1077.2012.12091 CSTR: 32189.14.SP.J.1077.2012.12091

碳化硼球面薄膜及空心微球的制备

于小河¹, 卢铁城^1,2, 林涛¹, 王自磊¹, 陶勇¹, 廖志君^1,3

(1. 四川大学物理系, 辐射物理及技术教育部重点实验室, 成都 610064; 2. 中国科学院国际材料物理中心, 沈阳110015; 3. 四川大学高能量密度与物理技术教育部重点实验室, 成都 610064)

收稿日期:2012-02-13 修回日期:2012-04-29 出版日期:2012-12-20 网络出版日期:2012-11-19
作者简介:于小河(1986–), 女, 硕士研究生. E-mail: xiaohe19861111@163.com

Preparation of Boron Carbide Spherical Films and Hollow Microsphere

YU Xiao-He¹, LU Tie-Cheng^1,2, LIN Tao¹, WANG Zi-Lei¹, TAO Yong¹, LIAO Zhi-Jun^1,3

(1. Department of Physics, Key Laboratory of Radiation Physics and Technology of Ministry of Education, Sichuan University, Chengdu 610064, China; 2. International Center for Material Physics, Chinese Academy of Sciences, Shenyang 110015, China; 3. Key Laboratory for High Energy Density Physics and Technology of Ministry of Education, Sichuan University, Chengdu 610064, China)

Received:2012-02-13 Revised:2012-04-29 Published:2012-12-20 Online:2012-11-19
About author:YU Xiao-He. E-mail: xiaohe19861111@163.com

摘要/Abstract

摘要： 采用电子束蒸发镀膜技术, 结合磁控滚动方法在Φ1 mm的钢球基底上制备碳化硼球面膜层, 通过退火、打孔及腐蚀获得碳化硼空心微球. 主要研究了球面膜层的宏观形貌、微观结构、成分及初步探讨了不同退火温度(800~1100℃)对核膜结构空心化的影响. 利用扫描电子显微镜(SEM)、X射线光电子能谱分析(XPS)、原子力显微镜(AFM)对球面薄膜表面形态和薄膜元素组成进行了分析. 结果表明: 磁控滚动模式制备的球面膜层表面平整, 没有裂纹和孔洞, 元素分布均匀. 核膜结构(镀膜时间在5~70 h)经900℃以上温度退火, 空心化后的球面膜层可实现自支撑, 900℃退火的微球表面形貌最好, 壁厚可达10 μm以上.

关键词: 电子束真空蒸发, 磁控滚动方法, 碳化硼球面薄膜, 碳化硼空心微球

Abstract: Boron carbide spherical-films were prepared by electron-beam evaporation deposition technique on steel ball substrates,combined with a independently designed magnetron rolling method. The boron carbide micro-shell was obtained after sintering, drilling and corrosion. The microcosmic appearance, microstructure, morphology, element composition of the boron carbide spherical films were investigated. The effect of annealing temperature (800–1100℃) on the boron carbide hollow micro-shells was also studied. The products were characterized by scanning electron microscope (SEM), X-ray photoelectron spectroscope (XPS), atomic force microscope (AFM). The results show that the film is dense without any cracks and pores. Besides, the elemental distribution is well-proportioned. When the annealing temperature is over 900℃, the coating is self-standing formed into a hollow microsphere. The hollow microsphere annealed at 900℃ has the best micro appearance with a thickness over 10 μm.

Key words: electron beam vacuum evaporation, magnetron rolling method, boron carbide spherical films, boron carbide hollow micro-shells

中图分类号:

O484

于小河, 卢铁城, 林涛, 王自磊, 陶勇, 廖志君. 碳化硼球面薄膜及空心微球的制备[J]. 无机材料学报, 2012, 27(12): 1325-1330.

YU Xiao-He, LU Tie-Cheng, LIN Tao, WANG Zi-Lei, TAO Yong, LIAO Zhi-Jun. Preparation of Boron Carbide Spherical Films and Hollow Microsphere[J]. Journal of Inorganic Materials, 2012, 27(12): 1325-1330.

参考文献

[1] ZHANG Bao-Ling, HE Zhi-Bing, WU Wei-Dong, et al. Influence of bounce mode on surface roughness of CH coating on microshells. High Power Laser and Particle Beams. 2008, 46(3): 647–651.

[2] ZENG Yi, FENG Jing-Wei, ZHANG Ye-Fang, et al. Relationship between properties and microstructure of plasma sprayed boron carbide coating. Journal of Inorganic Materials, 2000, 15(1): 137–142.

[3] TANG Guo-Hong, ZHANG Xing-Hua, CHEN Chang-Qi. A comprehensive review on boron carbide. Materials Review, 1994, 4: 69–72.

[4] PEI Li-Zhai, XIAO Han-Ning, ZHU Bao-Jun, et al. Latest development of boron carbide powder and diphasec ceramics. Rare Metals Cemented Carbides, 2004, 32(4): 46–50.

[5] Zhang H. Preparation of cross sections of thermal spray coatings for TEM investigation. Journal of Thermal Spray Technology, 1992, 1(1): 83–88.

[6] Aoqui Shin-ichi, Miyata Hisatomo, Ohshima Tamiko, et al. Preparation of boron carbide thin film by pulsed KrF excimer laser deposition process. Thin Solid Films, 2002, 407(1/2): 126–131.

[7] Lazzari R, Vast N, Besson J M, et al. Atomic structure and vibrational properties of icosahedral B4C boron carbide. Physical Review letters, 1999, 83(16): 3230–3233.

[8] Buzhinskij O I, Semenets Yu M. Thick boron carbide coatings for protection of tokamak first wall and divertor. Fusion Eng. Design, 1999, 45(4): 343–360.

[9] Zhang H Z,Wang R M, You L P, et al. Boron carbide nanowires with uniform CNx coatings. New Journal of Physics, 2007, 9(13): 1–9.

[10] Deng F, Xie H Y, Wang L. Synthesis of submicron B4C by mechanochemical method. Materials Letters, 2006, 60(13/14): 1771–1773.

[11] Burnham Alan K, Alford Craig S, Makowiecki Daniel M, et al. Evalutation of B4C as an ablator material for NIF capsules. Fusion Technology, 1997, 31(4): 456–462.

[12] TANG Yong-Jian, ZHAN Lin, WU Wei-Dong, et al. Research progress on ICF target materials and target fabrication technology. High Power Laser and Particle Beams, 2008, 20(11): 1827–1840.

[13] Mc Elfresh M, Gunther J, Alford C, et al. Fabrication of beryllium capsules with copper-doped layers for NIF targets: a progress report. Fusion Science and Technology, 2006, 49(4): 786–795.

[14] ZHENG Xue-Bin, JI Heng, HUANG Jing-Qi, et al. Preparation and laser ablation test of vacuum plasma sprayed boron carbide coatings. Journal of Inorganic Materials, 2005, 20(6): 1509–1514.

[15] 廖志君, 刘振良, 杨水长, 等. 电子束蒸发制备碳化硼薄膜的方法. 中国专利: Zl 2008 1 0045603.8, 2009-12-02.

[16] 廖志君, 范强, 王自磊, 等. 电子束蒸发技术制备碳化硼薄膜的方法与装置. 中国专利: Zl 2009 1 0060287.6, 2010-12-01.

[17] GAO Dang-Zhong, LIU Yuan-Qiong, LUO Qing, et al. X-ray radiograph of multi-layer plastics shell. High Power Laser and Particle Beams, 2004, 16(9): 1157–1160.

[18] SUN Jun-Long, DENG Jian-Xin, LIU Chang-Xia, et al. Study progress of boron carbide coating. Tool Engineering, 2006, 40(5): 3–5.

[19] CHEN Hai-Ying, WANG Jing, YANG Hai, et al. Synthesis of boron carbide films by ion beam sputtering. Surface and Coatings Technology, 2000, 128-129: 370–374.

[20] WEI De-Jun, LIN Lei-Ting, LI Ping, et al. Study on sinter of boron carbide ceramics. Liaoning Chemical Industry, 2006, 35(8): 446–448.

[21] Jacobsohn L G, Nastasi M. Sputter-deposited boron carbide films: Structural and mechanical characterization. Surface & Coatings Technology, 2005, 200: 1472–1475.

[22] WU Zhen-Gan, GU Ming-Yuan, ZHANG Guo-Ding. Oxidation characteristics of boron carbide. Journal of Inorganic Materials, 1997, 12(3): 1121–1128.

[23] ZENG Yi, ZHANG Ye-Fang, DING Chuan-Xian. Study on the oxidation of B4C powder and coating. Journal of Ceramics, 1998, 19(4): 183–187.

[24] Kulikovsky V, Vorlicek V, Ctvrtlik R, et al. Effect of air annealing on mechanical properties and structure of amorphous B4C films. Surface & Coatings Technology, 2011, 205: 4052–4057.

[25] 孙承松. 薄膜技术及应用. 沈阳: 东北大学出版社, 1998: 3–6.

碳化硼球面薄膜及空心微球的制备

Preparation of Boron Carbide Spherical Films and Hollow Microsphere

RichHTML

PDF (PC)

可视化

被引次数

摘要/Abstract

引用本文

使用本文

参考文献

相关文章 12

编辑推荐

Metrics

本文评价

[1]	李帅, 何迪, 刘晓鹏, 张超, 王树茂, 于庆河, 邱昊辰, 蒋利军. 316L不锈钢基体氧化铝涂层的氢渗透性能[J]. 无机材料学报, 2013, 28(7): 775-779.
[2]	张有为, 万里, 程新红, 王中健, 夏超, 曹铎, 贾婷婷, 俞跃辉. 采用水基原子层沉积工艺在石墨烯上沉积Al₂O₃介质薄膜研究[J]. 无机材料学报, 2012, 27(9): 956-960.
[3]	金晶, 张新夷, 周映雪. Mn掺杂ZnO薄膜的软X射线发射光谱研究[J]. 无机材料学报, 2012, 27(3): 296-300.
[4]	秦秀娟, 韩司慧智, 赵琳, 左华通, 宋士涛. 气溶胶辅助化学气相沉积制备Al掺杂ZnO透明导电薄膜[J]. 无机材料学报, 2011, 26(6): 607-612.
[5]	李曼, 刘保亭, 王玉强, 王宽冒. 快速退火对 Ni-Al-O 栅介质结构和介电性能的影响[J]. 无机材料学报, 2011, 26(3): 257-260.
[6]	苏青峰, 史伟民, 王林军, 李东敏, 夏义本. 超声物理气相沉积法制备 (00l) 取向 HgI₂ 膜的研究[J]. 无机材料学报, 2011, 26(3): 261-264.
[7]	王永霞, 冶银平, 李红轩, 吉利, 陈建敏, 周惠娣. 退火温度对 a-C:H 膜结构及摩擦学性能的影响[J]. 无机材料学报, 2011, 26(2): 209-213.
[8]	魏娜娜, 韦奇, 李振杰, 李群艳, 聂祚仁. 铜掺杂二氧化硅膜的制备及孔结构研究[J]. 无机材料学报, 2010, 25(10): 1047-1052.
[9]	吴子华, 谢华清. La_1-xCa_xMnO₃低温高磁场下的电脉冲诱导电阻转变效应[J]. 无机材料学报, 2010, 25(9): 961-965.
[10]	王文静, 袁慧敏, 萧淑琴. 不同退火过程对FeZrBCu软磁合金薄膜巨磁阻抗效应的影响[J]. 无机材料学报, 2010, 25(7): 721-724.
[11]	程学瑞1, 戚泽明2, 3, 张国斌2, 3, 李亭亭2, 3, 贺博2, 3, 尹民1. HfO₂栅介质薄膜的结构和介电性质研究[J]. 无机材料学报, 2010, 25(5): 468-472.
[12]	杨靖,陈杰瑢,余嵘. 溶胶-凝胶法改性SiO₂膜的润湿性与水汽稳定性[J]. 无机材料学报, 2008, 23(4): 739-744.