无机材料学报

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生长条件对BiFeO3纳米岛内自组装铁电拓扑畴形成的影响

周厚霖, 宋志庆, 田国, 高兴森   

  1. 华南师范大学,华南先进光电子研究院,先进材料研究所,广州 510006
  • 收稿日期:2024-12-28 修回日期:2025-02-28
  • 作者简介:周厚霖(2000-),男,硕士研究生. E-mail:zhouhoulin2000@163.com
  • 基金资助:
    国家重点研发计划(2022YFB3807603); 国家自然科学基金重大研究计划重点项目(92163210); 广东省自然科学基金 (2024A1515011608)

Effects of Growth Conditions on the Formation of Self-assembly Grown Topological Domain in BiFeO3 Nanoislands

ZHOU Houlin, SONG Zhiqing, TIAN Guo, GAO Xingsen   

  1. Institute for Advanced Materials, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China
  • Received:2024-12-28 Revised:2025-02-28
  • About author:ZHOU Houlin(2000-), male, Master candidate. E-mail:zhouhoulin2000@163.com
  • Supported by:
    National Key R&D Program of China (2022YFB3807603); Major Research Plan of the National Natural Science Foundation of China (92163210); Guangdong Basic and Applied Basic Research Foundation (2024A1515011608)

摘要: 铁电材料中的极化拓扑畴结构具有丰富的物理特性,在新型微纳电子器件领域展示出广泛应用前景。设计与调控铁电拓扑畴的形态是实现其器件化应用的基础。本工作系统地研究了生长条件对BiFeO3薄膜弯曲隆起形成的纳米岛内中心型极化拓扑畴形态的影响机制。实验结果表明,中心型拓扑畴的形成与底层SrRuO3电极纳米岛、纳米岛尺寸、BiFeO3外延生长的温度与沉积厚度紧密相关。在电极纳米岛横向尺寸介于300~400 nm时,可导致后续生长BiFeO3薄膜的隆起诱导形成纳米岛,同时也诱导形成中心型四象限拓扑畴构型。随着电极纳米岛高度逐渐增加,铁电纳米岛的畴结构从薄膜的条带畴转变为中心型拓扑畴;当电极直径大于500 nm时,中心畴会转变为之字形畴壁的构型,表明形貌隆起带来的挠曲电效应对拓扑畴形成的重要作用。在特定参数范围内(生长温度690~730℃,BiFeO3厚度30~60 nm),提高生长温度有利于形成完整四象限中心型拓扑畴,也进一步说明薄膜缺陷、畴壁能与挠曲等多种因素协同作用机制。同时,这种中心型拓扑畴可以通过外场调控翻转,并诱导高/低导电态切换,为开发基于极化拓扑电子器件打下基础。

关键词: 铁酸铋, 自组装, 纳米岛阵列, 中心型拓扑畴, 挠曲电效应

Abstract: Ferroelectric topological domain structures exhibit rich physical properties and demonstrate a wide range of application potential for next-generation nanoelectronic devices. The fundamental issue for the applications of topological devices lies in the precise design and control of ferroelectric topological domain states. In this work, we investigated the growth condition effects on center-type quadrant topological doman configurations in BiFeO3 nanoislands formed through bending-induced bulges, which were generated by underlying electrode SrRuO₃ nanoislands. The experimental results indicate that the formation of central-type topological domains is closely related to the growing conductions of SrRuO₃electrode nano-islands, nano-islands dimensions, the temperature of BiFeO₃epitaxial growth, and the deposition thickness. When the lateral size of the electrode nano-islands ranges from 300 nm to 400 nm, the subsequently grown BiFeO₃thin film can be induced by the underlying electrode protrusions to develop nano-islands, and central-type four-quadrant topological domains. As the height of the electrode nano-islands gradually increases, the domain structure of the ferroelectric nano-islands changes from the stripe domains of the thin film to the central-type topological domains. However, at the diameter of electrode nano-island exceeding 500 nm, the central domain transforms into a zigzag domain-wall configuration, demonstrating the important role of flexoelectric effects induced by the morphological protrusions in the formation of topological domains. Within a certain growth parameters ( growth temperature: 690-730 °C; BiFeO₃ thickness: 30-60 nm), increasing the growth temperature facilitate the formation of complete four-quadrant central-type topological domains, highlighting synergistic interactions among defects, domain wall energy, and fexoelectric effects on the formation central domain states. This central-type topological domain can also be switched by external field, and simultaneously induce switching between high/low conductive states, laying a foundation for the further construction of polarization topological electronic devices.

Key words: BiFeO3, self-assembly, nanoisland arrays, quad-domain textures, flexoelectric effect

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