超声振动辅助激光退火对FTO薄膜光电性能的影响

doi:10.15541/jim20160695

无机材料学报 ›› 2017, Vol. 32 ›› Issue (10): 1083-1088.DOI: 10.15541/jim20160695 CSTR: 32189.14.10.15541/jim20160695

超声振动辅助激光退火对FTO薄膜光电性能的影响

任乃飞^1,3, 曹海迪^1,3, 黄立静^1,3, 李保家^2,3, 祖伟^1,3

(江苏大学1. 机械工程学院; 2. 材料科学与工程学院; 3. 光子制造科学技术中心江苏省重点实验室, 镇江 212013)

收稿日期:2016-12-23 修回日期:2017-03-18 出版日期:2017-10-20 网络出版日期:2017-09-21
作者简介:任乃飞(1964–), 男, 博士, 教授. E-mail: rnf@ujs.edu.cn
基金资助:
国家973计划(2011CB013004);国家自然科学基金(61405078);江苏省自然科学基金(BK20140567);江苏省重点研发计划(BE2015037);江苏省高校自然科学研究项目(11KJA460003, 14KJB430008);江苏省博士后科研资助计划项目(1402090B, 1601008B);江苏省“六大人才高峰”项目(2013-ZBZZ-025)

Ultrasonic-Vibration-Assisted Laser Annealing on Photoelectric Properties of FTO Thin Films

REN Nai-Fei^1,3, CAO Hai-Di^1,3, HUANG Li-Jing^1,3, LI Bao-Jia^2,3, ZU Wei^1,3

(1. School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, China; 2. School of Materials Science and Engineering, Jiangsu University, Zhenjiang 212013, China; 3. Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology, Jiangsu University, Zhenjiang 212013, China)

Received:2016-12-23 Revised:2017-03-18 Published:2017-10-20 Online:2017-09-21
About author:REN Nai-Fei. E-mail: rnf@ujs.edu.cn
Supported by:
National Plan of 973 (2011CB013004);National Natural Science Foundation of China (61405078);Natural Science Foundation of Jiangsu Province of China (BK20140567);Science and Technology Planned Project of Jiangsu Province of China (BE2015037);Natural Science Foundation of the Jiangsu Higher Education Institutions of China (11KJA460003, 14KJB430008);Jiangsu Planned Projects for Postdoctoral Research Funds (1402090B, 1601008B);Six Talent Peaks Project in Jiangsu Province of China (2013-ZBZZ-025)

摘要/Abstract

摘要：

在激光退火处理掺氟二氧化锡(FTO)透明导电薄膜过程中引入超声振动, 研究了超声振动辅助激光退火对FTO薄膜晶体结构、表面形貌和光电性能的影响。结果表明: 与未施加超声振动时相比, 该方法可使薄膜上下位移而引起激光聚焦状态发生连续变化, 由此保证薄膜处于最佳退火范围内, 同时还可使薄膜表面激光熔融区域的颗粒被振动分散, 由此抑制颗粒团聚, 提高颗粒分布的均匀性和致密度, 最终有效地改善薄膜的光电性能。当振动功率为300 W时, 薄膜表面结构最为均匀、致密和平整, 此时光电性能达到最佳, 它在400~800 nm波段的平均透光率为84.7%, 方块电阻为9.0 Ω/□。

关键词: 掺氟二氧化锡(FTO), 超声振动, 激光退火, 光电性能

Abstract:

A novel way, i.e. introducing ultrasonic vibration during the laser annealing process, was developed for treating fluorine-doped tin oxide (FTO) transparent conducting thin films. The influences of ultrasonic-vibration-assisted laser annealing on crystal structure, surface morphology and photoelectric properties of the FTO films were investigated. The experimental results indicated that application of ultrasonic vibration during laser annealing caused the films to move up and down and thus brought about a continuous change in laser focusing state, ensuring the films to be in the optimum location to undergo laser annealing. Meanwhile, it could enable the particles in the laser-molten zone on the film surfaces to be dispersed through vibration, thus restraining the agglomeration of the particles and enhancing the uniformity and compactness of the films. As a result, photoelectric properties of the FTO films were effectively improved. It was found that the FTO film obtained by using a vibration power of 300 W was more uniform, compact and smooth, thereby yielding the optimal photoelectric properties with an average optical transmittance of 84.7% in the waveband range of 400~800 nm and a sheet resistance of 9.0 Ω/□.

Key words: fluorine-doped tin oxide (FTO), ultrasonic vibration, laser annealing, photoelectric properties

中图分类号:

任乃飞, 曹海迪, 黄立静, 李保家, 祖伟. 超声振动辅助激光退火对FTO薄膜光电性能的影响[J]. 无机材料学报, 2017, 32(10): 1083-1088.

REN Nai-Fei, CAO Hai-Di, HUANG Li-Jing, LI Bao-Jia, ZU Wei. Ultrasonic-Vibration-Assisted Laser Annealing on Photoelectric Properties of FTO Thin Films[J]. Journal of Inorganic Materials, 2017, 32(10): 1083-1088.

图/表 9

图1 超声振动辅助激光退火处理装置示意图

Fig. 1 Schematic diagram of ultrasonic-vibration-assisted laser annealing treatment equipment

图2 未处理及不同功率的超声振动辅助激光退火处理后FTO薄膜样品的XRD图谱

Fig. 2 XRD patterns of the untreated FTO film sample and the FTO film samples obtained by ultrasonic-vibration-assisted laser annealing using different vibration powers

表1 未处理及不同功率超声振动辅助激光退火处理后FTO薄膜样品的晶粒尺寸(D)和表面RMS粗糙度

Table 1 Grain sizes (D) and surface RMS roughnesses of the untreated FTO film sample and the FTO film samples obtained by ultrasonic-vibration-assisted laser annealing using different vibration powers

Power/W	D/nm	RMS/nm
Untreated	22.5	37.6
0	27.3	48.7
100	26.7	29.3
200	25.2	20.5
300	23.9	14.2
400	22.9	26.3
500	21.6	35.8

图3 未处理FTO薄膜样品的SEM(a)和AFM(b)图片

Fig. 3 SEM (a) and AFM (b) images of untreated FTO film sample

图4 不同功率超声振动辅助激光退火处理后FTO薄膜样品的SEM照片

Fig. 4 SEM images of the FTO film samples obtained by ultrasonic-vibration-assisted laser annealing using different vibration powers(a) 0 W; (b) 100 W; (c) 200 W; (d) 300 W; (e) 400 W; (f) 500 W

图5 300 W样品的AFM图片

Fig. 5 AFM image of the 300-W sample

图6 超声振动辅助激光退火处理过程中FTO薄膜表面颗粒分布变化示意图

Fig. 6 Schematic diagram for evolution of particle distribution on the FTO film surface during ultrasonic-vibration-assisted laser annealing process

图7 未处理及不同功率超声振动辅助激光退火处理后FTO薄膜样品的透射光谱图

Fig. 7 Transmittance spectra of the untreated FTO film sample and the FTO film samples obtained by ultrasonic-vibration- assisted laser annealing using different vibration powers

表2 不同功率超声振动辅助激光退火处理后FTO薄膜样品的平均透光率(Tav)和方块电阻(Rsh)

Table 2 Average transmittances (Tav) and sheet resistances (Rsh) of the FTO film samples obtained by ultrasonic-vibration-assisted laser annealing using different vibration powers

Power/W	T_av (400~800 nm)/%	R_sh/(Ω·□^-1)
0	81.0	9.4
100	81.9	9.3
200	82.8	9.2
300	84.7	9.0
400	82.7	9.1
500	81.6	9.2

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超声振动辅助激光退火对FTO薄膜光电性能的影响

Ultrasonic-Vibration-Assisted Laser Annealing on Photoelectric Properties of FTO Thin Films

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