Journal of Inorganic Materials ›› 2015, Vol. 30 ›› Issue (1): 107-112.doi: 10.15541/jim20140371

• Orginal Article • Previous Articles    

Large-scale Fabrication of Tellurium Nanowire Arrays by Magnetron Sputtering with Controllable Morphology

Zhi-Wei ZHANG1(), Yuan DENG2   

  1. 1. Chinese Aeronautical Establishment, Beijing 100012, China
    2. Beijing Key Laboratory for Advanced Functional Materials and Thin Film Technology, School of Material Science and Engineering, Beihang University, Beijing 100191, China
  • Received:2014-07-21 Online:2014-10-28 Published:2014-12-29
  • Supported by:
    National Natural Science Foundation of China (51172008, 51002006)

Abstract:

A convenient template-free magnetron sputtering method was employed for fabrication of highly ordered single crystalline tellurium nanowire arrays at moderate substrate temperature (200℃). The phase, morphology and microstructure of the as-prepared films were characterized by powder X-ray diffraction (XRD), field emission scanning electron microscope (FESEM) and high resolution transmission electron microscope (HRTEM). The results indicate that the produced nanowire arrays are composed of single-crystalline Te nanowires, which grow along the [101] direction with needle like morphology. These nanowires have an average diameter of 100 nm and length up to about 1 μm. Working pressure and substrate temperature are both essential for the formation of Te nanowire arrays, which balance the diffusion and growth of Te along [101] direction and (101) plane. The growth mechanism of such nanostructure is proposed, including an absorbing-combining-nucleation-growth process.

Key words: tellurium, nanowire arrays, radio frequency magnetron sputtering

CLC Number: 

  • TB34