Journal of Inorganic Materials ›› 2015, Vol. 30 ›› Issue (1): 107-112.DOI: 10.15541/jim20140371

• Orginal Article • Previous Articles    

Large-scale Fabrication of Tellurium Nanowire Arrays by Magnetron Sputtering with Controllable Morphology

ZHANG Zhi-Wei1, DENG Yuan2   

  1. (1. Chinese Aeronautical Establishment, Beijing 100012, China; 2. Beijing Key Laboratory for Advanced Functional Materials and Thin Film Technology, School of Material Science and Engineering, Beihang University, Beijing 100191, China)
  • Received:2014-07-21 Online:2014-10-28 Published:2014-12-29
  • Supported by:
    National Natural Science Foundation of China (51172008, 51002006)


A convenient template-free magnetron sputtering method was employed for fabrication of highly ordered single crystalline tellurium nanowire arrays at moderate substrate temperature (200℃). The phase, morphology and microstructure of the as-prepared films were characterized by powder X-ray diffraction (XRD), field emission scanning electron microscope (FESEM) and high resolution transmission electron microscope (HRTEM). The results indicate that the produced nanowire arrays are composed of single-crystalline Te nanowires, which grow along the [101] direction with needle like morphology. These nanowires have an average diameter of 100 nm and length up to about 1 μm. Working pressure and substrate temperature are both essential for the formation of Te nanowire arrays, which balance the diffusion and growth of Te along [101] direction and (101) plane. The growth mechanism of such nanostructure is proposed, including an absorbing-combining-nucleation-growth process.

Key words: tellurium, nanowire arrays, radio frequency magnetron sputtering

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