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ISSN:1000-324X CN:31-1363/TQ
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Journal of Inorganic Materials
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中文
Surface Plasma Passivation of the Polycrystalline Silicon Thin Films by Using NH
3
or N
2
O Gas
ZENG Xiang-Bin,Johnny K O Sin,XU Zhong-Yang,RAO Rui
Journal of Inorganic Materials . 2001, (
4
): 693 -696 .
