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Journal of Inorganic Materials

Journal of Inorganic Materials

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XPS Studies of Synthesized B C N Films by Plasma Source Ion Nitriding

LEI Ming-Kai 1; 2, YUAN Li-Jiang 1 ,ZHANG Zhong-Lin 1, MA Teng Cai 2   

  1. 1. Department of Materials Engineering; Dalian University of Technology Dalian 116024 China; 2. National Laboratory of Materials Modification; Dalian University of Technology Dalian 116024 China
  • Received:1998-10-09 Revised:1999-01-04 Published:1999-08-20 Online:1999-08-20

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Abstract: The synthesized boron nitride and boron-carbon-nitrogen films by plasma source ion nitriding were analyzed by X-ray photoelectron spectroscopy
(XPS). The effects of boron, carbon and nitrogen elements in the films on the XPS results were studied making use of the film characteristics with the
controllable composition. The XPS revealed that the formation of boron nitride films was confirmed but the sp2 and sp3 plain microdomain structures were difficult distinguished, and the formation and bonding structures of boron-carbon-nitrogen
films could be determined. The synthesized boron-carbon-nitrogen films possessed a mixing structure of sp2 and sp3 plain microdomains
in the processes.

Key words: boron-carbon-nitrogen films, plasma source ion nitriding, X-ray photoelectron spectroscopy

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