Journal of Inorganic Materials ›› 2010, Vol. 25 ›› Issue (8): 845-850.DOI: 10.3724/SP.J.1077.2010.00845

• Research Paper • Previous Articles     Next Articles

Analysis of Gaseous Species in Chemical Vapor Deposition of SiC from MTS/H2

LU Cui-Ying1,2, CHENG Lai-Fei2, ZHAO Chun-Nian2, ZHANG Li-Tong2   

  1. (1. School of chemistry and chemical engineering, Yulin University, Yulin 719000, China; 2. National Key Laboratory of Thermostructure Composite Materials, Northwestern Polytechnical University, Xi’an 710072, China)
  • Received:2009-11-25 Revised:2010-03-15 Published:2010-08-20 Online:2010-07-19

Abstract:

Qualitative and quantitative analyses were carried out to investigate the effect of the deposition temperature, pressure and flow rate of chemical vapor deposition imposed on the concentrations of MTS/H2 CVD SiC gaseous species through GC/MS method. Decomposition procedures of MTS in H2 based on the reaction rate and concentrations of species were analyzed. The results show that: (1) the identified gaseous species are CH4、C2H6、C2H4, C3H6, C2H2, MTS, SiCl4 and CH3SiHCl2, of which the concentrations of CH4 and SiCl4 are comparatively higher; (2) temperature, pressure and flow rate have great effect on the concentrations of gaseous species, and their regular patterns follow the same dependence as the thermodynamics; (3) MTS mainly starts with the cracking and decomposition of Si-C, and experiences three stages, the reaction with H2, the formation of middle objects and also by-products. It is suggested that the main formation route of alkane is CH3®C2H6®C2H4®C2H2.

Key words: GC/MS, analysis of gaseous species, CVD SiC, MTS/H2

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