Abstract: NiO films, NiFe films and double-layered NiO/NiFe films were prepared on glass substrates by rf magnetron
sputtering. The temperature of substrates (T_S) were varied from room temperature (T_R) to 300℃. The H_C of NiFe films
deposited at T_R was 584A·m^-1, it became 184A·m^-1 while the T_S increased to 260℃ and the squareness of hysteresis loop became better. The H_C and H_EX of NiO (50 nm)/
NiFe (15 nm) deposited at T_R were 4000A·m^-1 and 1600A·m-¹, respectively. The H_C decreased to 3120A·m^-1 and H_EX
increased to 4640A·m^-1 while the T_S was 260℃. The squareness of hysteresis loop also became better and the blocking temperature (T_B) was 230℃. XRD analysis indicated that the NiO films deposited at T_R presented (220) texture whereas the films deposited at 260℃ showed (111) texture. The NiFe films deposited
at T_R and 260℃ both presented (111) texture, but the crystal particle size of the latter was larger.

Key words: temperature of substrate, exchange coupling, coercivity