1]Knauer A, Wenzel H, Kolbe T,et al. Appl. Phys. Lett.,2008,92(19): 191912-191914.  [2]Fujikawa S, Takano T, Kondo Y, et al. Jpn. J. Appl. Phys., 2008, 47(4):2941-2944.  [3]Kuo CH, Feng HC, Kuo CW, et al. Appl. Phys. Lett., 2007,90(14):142115-142117.  [4]Nagamatsu K, Okada N, Sugimura H, et al. J. Crystal Growth, 2007,310(7-9): 2326-2329.  [5]潘孝军,张振兴,贾 璐,等(PAN XiaoJun,et al).无机材料学报(Journal of Inorganic Materials),2007,22(7):725-728.  [6]Shatalov M, Chitnis A, Adivarahan V, et al. Appl. Phys. Lett., 2001,78(6): 817-819.  [7]Hirayama H. J.Appl.Phys.,2005, 97(9):091101-091119.  [8]Matsuoka T, Yoshimoto N, Sasaki T, et al. J. Electron. Mater., 1992, 21(2):157-163.  [9]McIntosh F G, Boutros K S, Roberts J C, et al. Appl. Phys. Lett.,1996, 68(1):40-42.  [10]Lima A P, Miskys C R, Karrer U, et al. J. Crystal Growth, 2000, 220(4):341-344.  [11]胡国新,王晓亮,孙殿照, 等.半导体学报,2003, 24(6):602-605.  [12]Monroy E, Gogneau N, Enjalbert F, et al. Appl. Phys. Lett., 2003, 82(14):2242-2244.  [13]Oder T N, Li J, Lin J Y, et al. Appl. Phys. Lett., 2000, 77(6): 791-793.  [14]Franssen G, Grzanka S, Czernecki R, et al. J. Appl. Phys., 2005, 97(10):103507-1-6. |