Journal of Inorganic Materials ›› 2011, Vol. 26 ›› Issue (6): 607-612.DOI: 10.3724/SP.J.1077.2011.00607

• Research Paper • Previous Articles     Next Articles

Fabrication of Transparent Conductive Al-doped ZnO Thin Films by Aerosol-assisted Chemical Vapour Deposition

QIN Xiu-Juan1,2, HAN Si-Hui-Zhi1, ZHAO Lin1, ZUO Hua-Tong1, SONG Shi-Tao3   

  1. (1. College of Environmental and Chemical Engineering, Yanshan University, Qinhuangdao 066004, China; 2. State Key Laboratory of Metastable Materials Science and Technology, Qinhuangdao 066004, China; 3. College of Physics and Chemistry, Hebei Normal University of Science and Technology, Qinhuangdao 066004, China)
  • Received:2010-08-19 Revised:2010-10-03 Published:2011-06-20 Online:2011-06-07
  • Supported by:

    Natural Science Foundation of Hebei Province (B200800758)

Abstract: Al-doped ZnO thin films were prepared by aerosol-assisted chemical vapour deposition (AACVD) on glass substrates. The effect of Al content (2at%-8at%) on the structural, optical and electrical properties of Al-doped ZnO thin films was investigated in detail. The samples were tested by XRD, SEM, EDAX and UV-Vis spectrophotometer. The results indicate that the AZO films have a hexagonal (wurtzite) structure without preferential orientation along c-axis, and however no Al related phases are observed. The average transmittances of the AZO film is over 72% in the visible regions. The optical band gap for the AZO films becomes narrow with the increasing Al dopant. The four-point probe technique is used to characterize thin films electrically. The data shows that Al dopant decrease the sheet resistance. The ZnO films doped with 6at% Al exhibit a minimum of sheet resistance (18Ω/□).

Key words: aerosol, chemical vapour deposition, Al-doped ZnO, transparent conductive thin films

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