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无机材料学报

无机材料学报

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电镀法制备CoNiMnP永磁薄膜阵列的研究

蒋洪川; 张金平; 张万里; 张文旭; 彭斌; 杨仕清   

  1. 电子科技大学微电子与固体电子学院 成都 610054
  • 收稿日期:2002-07-29 修回日期:2002-08-26 出版日期:2003-09-20 网络出版日期:2003-09-20

Studies on Electroplating CoNiMnP Permanent iFilm Arrays

JIANG Hong-Chuan; ZHANG Jin-Ping; ZHANG Wan-Li; ZHANG Wen-Xu; PENG Bin; YANG Shi-Qing   

  1. College of Microelectronics and Solid Electronics; University of Electronic Science and Technology of China. Chengdu 610054; China
  • Received:2002-07-29 Revised:2002-08-26 Published:2003-09-20 Online:2003-09-20

PDF (PC)

908

被引次数

33

摘要： 采用光刻和电镀技术在5mm×5mm×0.2mm的硅片上设计并制备了2000个大小为50μm×50μm的CoNiMnP垂直各向异性永磁薄膜阵列,并对该薄膜陈列的组成、磁性能等进行了分析与测试.结果表明:薄膜阵列的组成为:Co90.32wt％、Ni7.83wt％、Mn0.74wt％、P1.11wt％,阵列垂直方向磁性能为:Hc=59.7kA/m,Br=0.53T,(BH)max=11.3kJ/m3;阵列水平方向磁性能为:Hc=27.8kA/m,Br=53715T,(BH)max=1.585kJ/m3.

关键词: CoNiMnP永磁薄膜阵列, 电镀, 垂直各向异性

Abstract: Using photolithographing and electroplating techniques, CoNiMnP permanent film arrays were
designed and fabricated. The microstructure, material composition and magnetic performances of the deposited film arrays were tested and analyzed.
The eletroplated permanent film arrays contain 2000 magnets of 50μm×50μm in a cubic shape on the silicon substrate of 5mm×5mm×0.2mm. The results show that high magnetic performances CoNiMnP
permanent film arrays with vertical anisotropy can be fabricated with current density less than 10mA/cm2 at room temperature. The deposited
film array compositions are as follows: Co90.32wt%, Ni 8.73wt%,Mn 0.74wt%, P1.11wt%. The vertical direction magnetic parameters are Hc=59.7kA/m,
Br=0.53T, (BH)max=11.3kJ/m3, while Hc=27.8kA/m, Br=0.42T, (BH)max=3.2kJ/m3 in the lateral direction.

Key words: CoNiMnP permanent film arrays, electroplating, vertical anisotropy

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