利用脉冲激光真空弧沉积技术制备类金刚石薄膜

无机材料学报

利用脉冲激光真空弧沉积技术制备类金刚石薄膜

蒋娜娜, 邵天敏, 陈大融

清华大学摩擦学国家重点实验室, 北京 100084

收稿日期:2004-01-12 修回日期:2004-04-19 出版日期:2005-01-20 网络出版日期:2005-01-20

Pulsed-laser-arc Deposition of Diamond Like Carbon Films

JIANG Na-Na, SHAO Tian-Min, CHEN Da-Rong

State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China

Received:2004-01-12 Revised:2004-04-19 Published:2005-01-20 Online:2005-01-20

摘要/Abstract

摘要： 介绍了一种新的脉冲激光真空弧沉积技术, 利用该技术在硅基片上制备了类金刚石薄膜. 利用激光拉曼分析技术对沉积膜进行了结构分析, 结果表明沉积膜为非晶结构, 具有明显的sp³
结构特征. 同时利用纳米划痕压痕仪、原子力显微镜等分析设备对膜的表面形貌、微观摩擦学性能进行了分析, 结果表明Si<100>基片上沉积膜的表面形貌和微观摩擦学性能略优于
Si<111>基片上沉积的薄膜, 其摩擦系数平均值为0.036.

关键词: 脉冲激光真空弧, 类金刚石薄膜, 激光拉曼, 摩擦系数

Abstract: Pulsed-laser-arc deposition technique was introduced. Diamond like carbon (DLC) films were deposited on Si<111> and Si<100> respectively. Results of laser
raman spectroscopy showed that the as-deposit films were amorphous, having obvious sp³ structure. Meanwhile, surface topography and micro-tribological
character were investigated by using atomic force microscope and nano-scratch tester. The results show that the surface microstructure and micro-tribological
character of the film deposited on Si<100> is better than that deposited on Si<111>. The average friction coefficient of the film on Si<100> is 0.036.

Key words: pulsed-laser-arc, diamond like carbon film, laser raman spectroscopy, friction coefficient

中图分类号:

O484

蒋娜娜,邵天敏,陈大融. 利用脉冲激光真空弧沉积技术制备类金刚石薄膜[J]. 无机材料学报.

JIANG Na-Na,SHAO Tian-Min,CHEN Da-Rong. Pulsed-laser-arc Deposition of Diamond Like Carbon Films[J]. Journal of Inorganic Materials.

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