无机材料学报

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NO和N2O流量对ZnO薄膜p型导电性能的影响

周婷; 叶志镇; 赵炳辉; 徐伟中; 朱丽萍   

  1. 浙江大学硅材料国家重点实验室, 杭州 310027
  • 收稿日期:2004-06-03 修回日期:2004-07-19 出版日期:2005-07-20 网络出版日期:2005-07-20

Effects of NO and N2O Flow Rates on Electronic Properties of p-type ZnO Thin Films

ZHOU Ting; YE Zhi-Zhen; ZHAO Bing-Hui; XU Wei-Zhong; ZHU Li-Ping   

  1. State Key Laboratory of Silicon Materials; Zhejiang University; Hangzhou 310027; China
  • Received:2004-06-03 Revised:2004-07-19 Published:2005-07-20 Online:2005-07-20

摘要: 采用金属有机化学气相沉积(MOCVD)方法,由NO和N2O混合气体在玻璃衬底上沉积了p型ZnO薄膜.NO和N2O流量分别为40和25 sccm时,得到最低电阻率5.52Ω·cm, 同时样品的空穴浓度最高,为2.17×1018cm-3,电性能的稳定性也最好.全部样品放置四个月后仍为p型,但电阻率增大.

关键词: P型ZnO, 导电性能, MOCVD

Abstract: Nitrogen-doped p-type zinc oxide (ZnO) thin films were deposited on glass substrates by metalorganic chemical vapor deposition (MOCVD). The p-type ZnO, with the lowest resistivity of 5.52Ω·cm and the highest hole concentration of 2.17×1018cm-3, can be achieved at the NO and N20 flow rates of 40 and 25sccm, respectively, and the sample was most stable. Four months later, all samples still showed p-type conduction, but the resistivities were increased.

Key words: p-type ZnO, electronic properties, MOCVD

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