无机材料学报

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直接感光法制备钛酸锶钡图形化薄膜及其性能研究

张卫华, 袁媛, 石春梅, 赵高扬   

  1. 西安理工大学材料科学与工程学院, 西安 710048
  • 收稿日期:2007-10-15 修回日期:2007-12-28 出版日期:2008-09-20 网络出版日期:2008-09-20

BST Patterned Films Prepared by Direct Patterning Process and Their Properties

ZHANG Wei-Hua, YUAN Yuan, SHI Chun-Mei, ZHAO Gao-Yang   

  1. The Faculty of Material Science and Engineering, Xi’an University of Technology, Xi’an 710048, China
  • Received:2007-10-15 Revised:2007-12-28 Published:2008-09-20 Online:2008-09-20

摘要: 采用改进的化学修饰的溶胶-凝胶工艺, 以聚乙烯吡咯烷酮(PVP)为薄膜开裂抑制剂, 以乙酰丙酮为化学修饰剂, 利用乙酰丙酮可以与金属盐形成的配位螯合物的特性, 制备了具有紫外光感光特性的钛酸锶钡(Ba0.8Sr0.2TiO3)前驱溶胶及其凝胶薄膜; 结合直接感光法, 首先制备图形化凝胶薄膜, 再通过后续热处理, 在Pt/TiO2/SiO2/Si衬底上最终得到了具有钙钛矿结构的钛酸锶钡图形化薄膜, 其图形厚度约为793nm, 相对介电常数约为600, 介电损耗约为0.03.

关键词: BST薄膜, 感光性, 微细图形, 溶胶-凝胶工艺

Abstract: The ultraviolet light photosensitive Ba0.8Sr0.2TiO3 (BST) sol and gel films were prepared by using chemical modification and modified sol-gel process with polyvinylpyrrolidone (PVP) as crack-suppressing agent, and acetylacetone (AcAcH) as chemical modifier agent which can associate metal-salt to form coordination chelate. The BST patterned gel films were prepared by irect patterning process. Then the BST patterned films with perovskite structure on Pt/TiO2/SiO2/Si substrate were obtained after subsequent heat treatment. The thickness of the BST patterned film is about 793nm, the dielectric constant and dielectric loss of the BST patterned film are about 600 and 0.03, respectively.

Key words: BST Thin Film, photosensitivity, fine patterning, sol-gel process

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