TiAlN/VN纳米多层膜的微结构与力学和摩擦学性能

doi:10.15541/jim20170052

无机材料学报 ›› 2017, Vol. 32 ›› Issue (12): 1280-1284.DOI: 10.15541/jim20170052 CSTR: 32189.14.10.15541/jim20170052

TiAlN/VN纳米多层膜的微结构与力学和摩擦学性能

李淼磊^1,2, 王恩青^1,2, 岳建岭^1,2, 黄小忠^1,2

1. 中南大学, 航空航天学院, 长沙 410083;
2. 中南大学, 新型特种纤维及其复合材料湖南省重点实验室, 长沙 410083

收稿日期:2017-01-23 修回日期:2017-03-14 出版日期:2017-12-20 网络出版日期:2017-11-21
作者简介:李淼磊(1991-), 女, 硕士研究生. E-mail: miaolei_li@163.com
基金资助:
国家自然科学基金(51201187);湖南省科技计划项目(2015TP1007);National Natural Science Foundation of China (51201187);Science and Technology Planning Project of Hunan Province (2015TP1007)

Microstructure, Mechanical and Tribological Property of TiAlN/VN Nano-multilayer Films

LI Miao-Lei^1,2, WANG En-Qing^1,2, YUE Jian-Ling^1,2, HUANG Xiao-Zhong^1,2

1. School of Aeronautics and Astronautics, Central South University, Changsha 410083, China;
2. Hunan Key Laboratory of Advanced Fibers and Composites, Changsha 410083, China

Received:2017-01-23 Revised:2017-03-14 Published:2017-12-20 Online:2017-11-21

摘要/Abstract

摘要：

采用反应磁控溅射制备了TiAlN/VN纳米多层膜, 并使用X射线衍射分析(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、纳米压痕仪和多功能摩擦磨损试验机对多层膜的微结构与力学和摩擦学性能进行了表征和分析。研究结果表明: 不同调制周期的TiAlN/VN多层膜均呈典型的柱状晶生长结构, 插入VN层并没有打断TiAlN涂层柱状晶的生长。在一定调制周期下, TiAlN/VN纳米多层膜中的TiAlN和VN层之间能够形成共格生长结构, 其硬度和弹性模量相比于TiAlN单层膜均有显著提升, 其中, TiAlN (10 nm)/VN (10 nm)的硬度和弹性模量最大增量分别达到39.3%和40.9%。TiAlN/VN纳米多层膜的强化主要与其共格界面生长结构有关。另外, TiAlN单层膜的摩擦系数较高(~0.9), 通过周期性地插入摩擦系数较低的VN层能够使得TiAlN的摩擦系数大大降低, TiAlN/VN纳米多层膜的摩擦系数最低为0.4。

关键词: 反应磁控溅射, TiAlN/VN纳米多层膜, 摩擦性能

Abstract:

A series of TiAlN/VN nano-multilayer films were prepared by reactive magnetron sputtering method. The effects of modulation structure on the microstructural evolution, mechanical and tribological properties were investigated by X-ray diffractometer, scanning electron microscope, high-resolution transmission electron microscope, nano- indention device and high vacuum tribometer. The results show that the structure of TiAlN/VN nano-multilayer films with different modulation periods are all typical columnar crystals. Meanwhile, the insertion of the VN sublayers does not interrupt the columnar crystal growth of TiAlN sublayers. In the TiAlN/VN nano-multilayer films, TiAlN sublayers grow coherently and epitaxially over VN sublayers under the critical modulation period. Correspondingly, the hardness and the modulus of the TiAlN/VN nano-multilayer films increase significantly, and the maximum hardness and elastic modulus of TiAlN (10 nm)/VN (10 nm) nano-multilayer films increase by about 39.3% and 40.9% compared with the TiAlN single film, respectively. The strengthening of the TiAlN/VN nano-multilayer films can be attributed to the coherent interfacial structure. In addition, the friction coefficient of TiAlN single film is about 0.9, while that of TiAlN/VN nano-multilayer films can be decreased significantly and reaches a minimum value of ~0.4 by the periodic insertion of the VN sublayers with lower friction coefficient ~0.3.

Key words: reactive magnetron sputtering, TiAlN/VN nano-multilayer films, tribological properties

中图分类号:

TG174

李淼磊, 王恩青, 岳建岭, 黄小忠. TiAlN/VN纳米多层膜的微结构与力学和摩擦学性能[J]. 无机材料学报, 2017, 32(12): 1280-1284.

LI Miao-Lei, WANG En-Qing, YUE Jian-Ling, HUANG Xiao-Zhong. Microstructure, Mechanical and Tribological Property of TiAlN/VN Nano-multilayer Films[J]. Journal of Inorganic Materials, 2017, 32(12): 1280-1284.

图/表 6

图1 TiAlN、VN单层膜和TiAlN(4 nm)/VN(4 nm)、TiAlN (10 nm)/VN(10 nm)多层膜的XRD图谱

Fig. 1 XRD patterns of TiAlN, VN single film and TiAlN/VN nano-multilayer films with different thicknesses

图2 溅射态TiAlN (10 nm)/VN (10 nm)多层膜TEM片

Fig. 2 TEM images of sputtered TiAlN(10 nm)/VN(10 nm) nano-multilayer films(a) BF-TEM and SAD images; (b) HR-TEM image; (c) FFT and IFFT images

图3 TiAlN (4 nm)/VN (4 nm) (a)、TiAlN(10 nm)/VN(10 nm) (b)纳米多层膜的断面SEM照片

Fig. 3 Cross-sectional SEM images of (a) TiAlN(4 nm)/ VN (4 nm) and (b) TiAlN(10nm)/VN(10 nm) nano-multilayer films

图4 TiAlN、VN单层膜和TiAlN/VN多层膜的加-卸载曲线

Fig. 4 Nanoindentation load-displacement of TiAlN, VN single film and TiAlN/VN multilayer films

表1 TiAlN、VN单层膜和TiAlN/VN多层膜的硬度及弹性模量

Table 1 Hardness and modulus of elasticity of TiAlN, VN single film and TiAlN/VN multilayer films

Sample	Hardness/GPa	E/GPa
TiAlN	27.5	484.9
VN	25.8	567.7
TiAlN(4 nm)/VN(4 nm)	31.2	516.6
TiAlN(10 nm)/VN(10 nm)	38.3	683.1

图5 TiAlN、VN单层膜和TiAlN/VN多层膜的摩擦系数

Fig. 5 Friction coefficient of the TiAlN, VN single film and TiAlN/VN multilayer films

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TiAlN/VN纳米多层膜的微结构与力学和摩擦学性能

Microstructure, Mechanical and Tribological Property of TiAlN/VN Nano-multilayer Films

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