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ISSN:1000-324X CN:31-1363/TQ
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Journal of Inorganic Materials
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中文
Thermal Stability of Atomic Layer Deposition Al
2
O
3
Thin Films
LU Hong-Liang,XU Min,DING Shi-Jin,REN Jie,ZHANG Wei
Journal of Inorganic Materials . 2006, (
5
): 1217 -1222 . DOI: 10.3724/SP.J.1077.2006.01217
