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Journal of Inorganic Materials

Journal of Inorganic Materials >

2007 , Vol. 22 >Issue 2: 354 - 358

DOI: https://doi.org/10.3724/SP.J.1077.2007.00354

Research Paper

Growth Process of Transparent and Compact ZnO Films Prepared by Galvanostatic Deposition

  • PENG Fang ,
  • LI Xiao-Min ,
  • GAO Xiang-Dong ,
  • YU Wei-Dong ,
  • QIU Ji-Jun
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  • 1. State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China; 2. Graduate University of Chinese Academy of Sciences, Beijing 100049, China

Received date: 2006-03-10

  Revised date: 2006-09-10

  Online published: 2007-03-20

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Abstract

Transparent and compact ZnO thin films with high c-axis preferred orientation were galvanostatically deposited in Zn(NO 3)2 solutions on the ITO substrate after an electrochemical pretreatment process. The crystallinity, microstructure of surface and cross section, and optical properties of obtained films were characterized by X-ray diffraction, scanning electron microscope and optical transmittance spectra. Results show that the deposition time has significant influences on the quality of ZnO films. At the later stage of film deposition (120min), ZnO film exhibits obvious decrease in the crystalline degree, surface smoothness, and transmittance, with the increase of crystallite sizes, which indicates that the deposition time must be optimized to obtain the electrodeposited ZnO film with high quality. In addition, the film thickness linearly changes with deposition time, illustrating the possibility to control the film thickness by deposition time.

Key words： ZnO film; electro-deposition; pretreatment; microstructure

Cite this article

PENG Fang , LI Xiao-Min , GAO Xiang-Dong , YU Wei-Dong , QIU Ji-Jun . Growth Process of Transparent and Compact ZnO Films Prepared by Galvanostatic Deposition[J]. Journal of Inorganic Materials, 2007 , 22(2) : 354 -358 . DOI: 10.3724/SP.J.1077.2007.00354

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