SiCN ceramic was fabricated by electro-thermal pyrolysis using hexamethyldisilazane as precursor. X-ray diffraction and transmission electron microscope were employed to study crystallization process of amorphous SiCN after annealing at temperature from 1700℃ to 1900℃ in vacuum. Decomposition-crystallization mechanism was used to characterize its crystallization process. Amorphous SiCN begin to decompose below 1300℃ in vacuum and Si-C-enriched districts are formed and then changes to form β-SiC crystal. Crystallinity degree increases as treated temperature rises. Phase transition from β-SiC to α-SiC occurs after annealing at 1700℃. The nitrogen is released in the form of N2 and Si3N4 crystal is not detected though it often exists in the SiCN annealed in N2 atmosphere.
XIA Yi
,
QIAO Sheng-Ru
,
WANG Qiang-Qiang
,
ZHANG Cheng-Yu
,
HAN Dong
,
LI Mei
. Crystallization of Amorphous SiCN Ceramic Annealed in Vacuum[J]. Journal of Inorganic Materials, 2009
, 24(4)
: 827
-830
.
DOI: 10.3724/SP.J.1077.2009.00827
[1]Shah S R, Raj R. Acta Mater., 2002, 50(16): 4093-4103.
[2]Chen L C, Chen K H, Wei S L, et al. Thin Solid Films, 1999, 355-356: 112-116.
[3]Zimmermann A, Bauer A, Christ M, et al. Acta Mater., 2002, 50(5):1187-1196.
[4]An L, Riedel R, Konetachny C, et al. J. Am. Ceram. Soc., 1998, 81(5):1349-1352.
[5]Bahloul D, Goursat P, Lavedrine A. J. Euro. Ceram. Soc., 1993, 11(1): 63- 68.
[6]Bharadwaj L, Fan Y, Zhang L, et al. J. Am. Ceram. Soc., 2004, 87(3): 483-486.
[7]Liew LA, Zhang W, Bright V M, et al. Sensors and Actuators A, 2001, 89(1/2): 64-70.
[8]Ziegler G, Kleebe H-J, Motz G, et al. Mater. Chem. Phys., 1999, 61(1):55-63.
[9]Kleebe H J, Suttor D, Müller H,et al. J. Am. Ceram. Soc., 1998, 81(11): 2971-2977.
[10]Schmidt H, Borchardt G, Müller A, et al. J. Non-Cryst. Solids, 2004, 341(1/2/3):133-140.
[11]Schiavon M A, Sorarù G D, Yoshida I V P. J. Non-Cryst. Solids, 2002, 304(1/2/3):76-83.
[12]江东亮, 陆忠乾, 黄政仁, 等(JIANG Dong-Liang, et al).无机材料学报(Journal of Inorganic Materials), 1997, 22(3): 356-362.
[13]乔生儒, 卢国锋, 钟杰华, 等.基体前驱体液气相热解制备碳/碳碳化硅复合材料的方法. 中国, 发明专利, ZL 2006 1 0043034.4. 2008.03.05.
[14]Izumi A, Oda K. Thin Solid Films, 2006, 501(1/2):195-197.
[15]Seifert HJ, Peng J, Lukas HL, et al. J. Alloys Comp., 2001, 320(2):251-261.