Research Paper

Effects of Deposition Temperature on the Microstructures of SiC Coatings by CVD

  • ZHANG Chang-Rui ,
  • LIU Rong-Jun ,
  • CAO Ying-Bin
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  • Key Laboratory of National Defense Technology, College of Aerospace & Materials Engineering, National University of Defense Technology, Changsha 410073, China

Received date: 2006-02-20

  Revised date: 2006-05-25

  Online published: 2007-01-20

Abstract

The coatings of SiC were prepared from the methyltrichlorosilane (MTS) by low pressure chemical vapor deposition from 950℃ to 1300℃. SEM was used to characterize the surface and cross-sectional morphologies of the as deposited coatings. The effects of temperature on the microstructures of SiC coatings were investigated. At 950℃, the as-deposited SiC coating is loose and the grains of the coating are fine. In the temperature range of 1000-1100℃, CVD SiC coatings show a dense and smooth surface morphology. However, in the temperature range of 1150-1300℃, the surface morphology of SiC coatings changes to rounded hillocks and the as-deposited coatings are very rough. Factors influencing the surface morphologies and structures of SiC coatings were studied through thermodynamics and nucleation-growth theory. The relationship between deposition temperature and SiC coatings’ cross-sectional morphologies can by listed as follows, the as deposited coatings are very dense and there are no holes when the deposition temperature is lower than 1200℃, however, the as deposited coatings become very loose at 1300℃. The inside structures of SiC coatings were interpreted by the island growth
model.

Cite this article

ZHANG Chang-Rui , LIU Rong-Jun , CAO Ying-Bin . Effects of Deposition Temperature on the Microstructures of SiC Coatings by CVD[J]. Journal of Inorganic Materials, 2007 , 22(1) : 153 -158 . DOI: 10.3724/SP.J.1077.2007.00153

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