The adsorption of H2 and H2NCH2CH2NH2 on the nickel-phosphate-basis
molecular sieves VSB-1 and CoVSB-1 was studied. The adsorption of H2 is a supercritical physisorption. The adsorption quantity of H2NCH2CH2NH2 on VSB-1 and CoVSB-1 is larger than that of H2O, C2H5 OH and other vapor of organicamines. VSB-1 and CoVSB-1 can adsorb 19.7wt％ and 24.3wt％ of H2NCH2CH2NH2 respectively. The chemisorption mechanism of H2NCH2CH2NH2 on VSB-1 and CoVSB-1 was verified by using XRD, FT-IR and UV-Vis characterization. The large adsorption quantity of H2NCH2CH2NH2 is caused by the chelation between H2NCH2CH2NH2 and the active sites of Ni and Co
in the frameworks of VSB-1 and CoVSB-1.
XIE Li-Li
,
HU Juan
,
WU Chun-Dong
. Adsorption Properties of the Nickel-phosphate-basis Molecular Sieves[J]. Journal of Inorganic Materials, 2007
, 22(1)
: 128
-132
.
DOI: 10.3724/SP.J.1077.2007.00128
[1] Barrer R M. Brit. Chem. Engl., 1959, 4: 267--279.
[2] Davis M E. Nature, 2002, 417: 813-821.
[3] Parrillo D J, Adamo A T, Kokotailo G T, et al. Appl. Catal., 1990, 67: 107--118. [4] Ghosh A K, Curthoys G. J. Chem. Soc., Faraday Trans. 1, 1984, 80: 99--109.
[5] Docquir F, Toufar H, Su B L. Langmuir, 2001, 17: 6282--6288.
[6] Docquir F, Norberg V, Toufar H, et al. Langmuir, 2002, 18: 5963--5966.
[7] Guillou N, Gao Q, Nogues M, et al. C. R. Acad. Sci. Paris II C 2, 1999. 387--392.
[8] 王秀丽, 高秋明(WANG Xiu-Li, et al). 无机材料学报(Journal of Inorganic Materials), 2005, 20 (3): 699--705.
[9] Forster P M, Eckert J, Chang J S, et al. J. Am. Chem. Soc., 2003, 125: 1309--1312.
[10] Xie L, Gao Q, Su X, et al. Micropor. Mesopor. Mater., 2004, 75: 135--141.
[11] Zhou Y, Feng K, Sun Y, et al. Chem. Phys. Letters, 2003, 380: 526--529.
[12] 周理, 吕昌忠, 王怡林, 等. 化学进展, 1999, 11: 221--226.
[13] Bennett A M A, Foulds G A, Thornton D A. Spectrochim. Acta, 1989, 45A: 219. [14] 吴瑾光. 科学技术文献出版社, 下卷, 1994. 281--284.
[15] Lever A B P. Inorganic electronic spectroscopy, 2nd ed.; Studies in
physical theoretical chemistry, Vol. 33, Elsevier, Amsterdam, 1984. 463--510.
[16] Xiong J M, Ding Y J, Zhu H, et al. J. Phys. Chem. B, 2003, 107: 1366--1369.
