Template-induced epitaxial crystallization of SiC, TiB2 and SiO2 in TiN/SiC, TiN/TiB2 and TiN/SiO2 nano-multilayer films and its influence on mechanical properties of the corresponding films were investigated. Results reveal that amorphous SiC, TiB2 and SiO2, which are more favorable under sputtering conditions, crystallize at smaller layer thicknesses due to the template effect of c-TiN layers. In particular, SiC crystallizes out in the face-centered cubic structure when its thickness is less than 0.6nm, which improves the crystal quality and structural integrity of the films; While TiB2, with thickness less than 2.9nm, forms hcp structure. The epitaxial orientation relationship between TiN and TiB2 is {111} TiN//{0001} TiB2, <100> TiN//<11-20> TiB2; SiO2, different from the above two, forms fcc pseudo-crystalline structure under a thickness of 0.9nm. With the crystallization of SiC, TiB2 and SiO2, hardness anomalous enhancement, i.e. superhardness effect, appears in those films. This phenomeon of hardness enhancement disappears rapidly when further increase the thickness of SiC, TiB2 and SiO2 layers, and at the same time, crystallines of SiC, TiB2 and SiO2 transform into their amorphous forms, respectively. The formation of these relatively soft amorphous layers, which blocks the coherent growth of the multilayer films, is the main reason of hardness decline at large SiC, TiB2 and SiO2 layer thicknesses.
KONG Ming
,
YUE Jian-Ling
,
LI Ge-Yang
. Crystallization of Amorphous and Superhardness Effect in Nano-multilayer Films[J]. Journal of Inorganic Materials, 2006
, 21(6)
: 1292
-1300
.
DOI: 10.3724/SP.J.1077.2006.01292
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