Nickel hydroxide (Ni(OH)2) thin films were deposited from a variety of solutions with different pH values by liquid phase deposition. Continuous Ni(OH)2 thin films were obtained within the pH ranging from 7.5 to 8.8. The nucleation and growth process of Ni(OH)2, and β-Ni(OH)2 crystallization were used to discuss the influence of solution pH on the microstructures of the Ni(OH)2 films. The thin films are made of Ni(OH)2 nanorods mainly with β-Ni(OH)2 crystallinity and there are a lot of open pores between the nanorods in the Ni(OH)2 films. The dimensions of Ni(OH)2 nanorods change remarkably with the pH of reactive solutions. When solution’s pH is 7.5, the length of nanorods is about 80nm and the diameter is about 50nm. When solution’s pH increases to 7.8, the length of nanorods increases to about 180nm and the diameter is about 60nm. When solution’s pH increases to 8.0, the length of nanorods sharply increases to about 300nm and the diameter is about 70nm. However, when solution’s pH increases to 8.3, the length of nanorods decreases to about 230nm and the diameter is about 80nm. When solution’s pH increases to 8.8, the length of nanorods sharply decreases to about 110nm and the diameter is about 55nm.
WANG Ru-Na
,
LI Qun-Yan
,
WANG Zhi-Hong
,
WEI Qi
,
NIE Zuo-Ren
. Influence of Solution pH on Nickel Hydroxide Thin Films Prepared by Liquid Phase Deposition[J]. Journal of Inorganic Materials, 2007
, 22(5)
: 889
-893
.
DOI: 10.3724/SP.J.1077.2007.00889
[1] French H M, Henderson M J, Hillman A R, et al. J. Electroanal. Chem., 2001, 500 (1-2): 192--207.
[2] Opallo M, Prokopowicz A. Electrochem. Commun., 2003, 5 (9): 737--740.
[3] Kowal A, Niewiara R, Pero\acutenczyk B, et al. Langmuir, 1996, 12 (10): 2332--2333.
[4] 何平, 计亚军, 唐敏, 等. 南京航空航天大学学报, 2005, 37 (5): 664--668.
[5] 李怀祥, 薛成山, 左传增. 山东师大学报(自然科学版), 2000, 15 (1): 41--45.
[6] 何向明, 李建军, 成宏伟, 等. (He Xiang-Ming, et al). 无机材料学报(Journal of Inorganic Materials), 2005, 20 (6): 1317--1321.
[7] Pejova B, Kocareva T, Najdoski M, et al. Appl. Surf. Sci., 2000, 165 (4): 271--278.
[8] Richardson T J, Rubin M D. Electrochimica Acta, 2001, 46 (13-14): 2119--2123.
[9] Nagayama H, Honda H, Kawahara H. J. Electrochem. Soc., 1988, 135 (8): 2013--2016.
[10] Deki S, Aoi Y, Hiroi O, et al. Chem Lett., 1996, 25 (6): 433--434.
[11] Deki S, Aoi Y, Okibe J, et al. J. Mater. Chem., 1997, 7 (9): 1769--1772.
[12] Wang D, Song C, Hu Z, et al. J. Phys. Chem. B, 2005, 109 (3): 1125--1129.
[13] He J, Lindstr\ddotom H, Hagfeldt A, et al. J. Phys. Chem. B, 1999, 103 (42): 8940--8943.
