氧化铝颗粒的表面改性及其在C平面(0001)蓝宝石衬底上的化学机械抛光(CMP)性质
汪为磊, 刘卫丽, 白林森, 宋志棠, 霍军朝
Surface Modified Alumina Particles and Their Chemical Mechanical Polishing (CMP) Behavior on C-plane (0001) Sapphire Substrate
WANG Wei-Lei, LIU Wei-Li, BAI Lin-Sen, SONG Zhi-Tang, HUO Jun-Chao
无机材料学报
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2017, (10): 1109
-1114
.
DOI: 10.15541/jim20170036
