无机材料学报 ›› 2010, Vol. 25 ›› Issue (11): 1228-1232.DOI: 10.3724/SP.J.1077.2010.10223 CSTR: 32189.14.SP.J.1077.2010.10223

• 研究快报 • 上一篇    

微图案BiFeO3薄膜的光刻自组装制备与表征

王 艳, 谈国强, 苗鸿雁   

  1. (陕西科技大学 教育部轻化工助剂化学与技术重点实验室, 西安 710021)
  • 收稿日期:2010-04-08 修回日期:2010-05-31 出版日期:2010-11-20 网络出版日期:2010-11-01
  • 基金资助:

    National Natural Science Foundation of China(50872077); Innovation Team Fundation of Shaanxi University of Science and Technology(TD09-05); Graduate Innovation Foundation of Shaanxi University of Technology(SUST-A04)

Preparation and Characterization of Micro-patterned BiFeO3 Films by Photolithography-self-assembly Method

WANG Yan, TAN Guo-Qiang, MIAO Hong-Yan   

  1. (Key Laboratory of Auxiliary Chemistry & Technology for Chemical Industry, Ministry of Education, Shaanxi University of Science and Technology, Xi'an710021, China)
  • Received:2010-04-08 Revised:2010-05-31 Published:2010-11-20 Online:2010-11-01
  • Supported by:

    National Natural Science Foundation of China(50872077); Innovation Team Fundation of Shaanxi University of Science and Technology(TD09-05); Graduate Innovation Foundation of Shaanxi University of Technology(SUST-A04)

摘要: 利用光刻自组装技术在玻璃基板上成功制备出图案化的BiFeO3薄膜. AFM和接触角测试表明, 紫外光照射引起十八烷基三氯硅烷(OTS)单层膜改性, 形成憎水的自组装单分子(SAM)区域和亲水的硅烷醇区域; XRD和XPS结果显示, OTS单层膜和紫外照射处理的玻璃基板表面诱导吸附的薄膜为纯相六方扭曲钙钛矿结构的BiFeO3薄膜; SEM和EDS表明, SAM区域沉积的BiFeO3薄膜不连续, 在超声波震荡下容易脱落, 而硅烷醇区域沉积的BiFeO3薄膜致密均一, 与基底结合牢固, 边缘轮廓清晰. 

关键词: 光刻自组装技术, BiFeO3薄膜, 微图案

Abstract: Micro-patterned BiFeO3 thin films were prepared successfully on glass substrates by photolithography-self-assembly method. The characterizations of samples were carried out through XRD, SEM, AFM, XPS and EDS. The results of AFM and contact angle test show that the modification of octadecyltrichlorosilane (OTS) monomolecular layer is achieved by UV-irradiation through a photomask, generating hydrophilic silanol areas and hydrophobic self-assembled monolayer (SAM) regions. XRD and XPS indicate that the films absorbed to the glass substrates are pure rhombohedrally distorted structure BiFeO3. In addition, SEM and EDS are employed to confirm that no continuous BiFeO3 particles deposited on SAM regions could be easily peeled off by ultrasonication, while a uniform and clear patterned film with good adherence is site-selectively formed in the hydrophilic silanol regions.

Key words: photolithography-self-assembly, BiFeO3 films, micro-patterns

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