金属Sn氧化薄膜的真空退火与原位XPS测量

无机材料学报

金属Sn氧化薄膜的真空退火与原位XPS测量

严辉; 马黎君; 陈光华; 黄世平¹; 文华杰¹; 郭伟民²

北京工业大学应用物理系; 北京 100022; 香港中文大学电子工程系¹,化学系² 香港沙田

收稿日期:1997-01-27 修回日期:1997-03-07 出版日期:1998-02-20 网络出版日期:1998-02-20

Vacuum Annealing and in-Situ XPS Measurement of Oxidized Sn Films

YAN Hui; MA Li-Jun; CHEN Guang-Hua; WONG Sei-Ping¹; MAN Wah-Kit¹; KWOK Wei-Man²

Department of Applied Physics; Beijing Polytechnic University Beijing 100022 China； Department of Electronic Engineering¹ Departement of Chemistry²; the Chinese Univcrsity of Hongkon， Shatin， Hongkong China

Received:1997-01-27 Revised:1997-03-07 Published:1998-02-20 Online:1998-02-20

摘要/Abstract

摘要： 本文研究了在真空退火过程中金属Sn氧化薄膜表面L元素Sn和O的化学性质．利用X射线光电子能谱（XPS）的表面分析方法，发现在金属Sn氧化薄膜的表面上存在大量的吸附氧粒子（O^-和O^-_2）提高真空退火温度，吸附氧粒子的数量增加；同时吸附氧粒子的负电性变弱．当退火温度低于350℃时，吸附氧粒子数量的增加是起因于SnO₂→Sn₂O₃的转变；在这种情况下，可以观察到Sn2O3是相对稳定的金属Sn氧化物，继续提高退火温度，达到400℃时，Sn在金属Sn中的相对含量急剧增大，Sn在金属Sn中相对含量增加的原因与金属Sn的价态Sn³⁺→Sn⁰的转变相关在这个转变过程中伴随着O的释放和薄膜表面氧粒子的进一步堆积．与温度低于350℃时的退火条件相比，XPS的测量也发现，在400℃的退火温度下；SnO₂相对于Sn₂O₃反而成为比较稳定的金属Sn氧化物．还讨论了金属Sn氧化薄膜表面上吸附氧粒子的吸附状态以及吸附状态与退火温度的关系．

关键词: 金属Sn氧化薄膜, 高温退火, 原位XPS测量

Abstract: The dependence of chemisitry properties of elements Sn and O on the surface of oxidized Sn films on vacuum annealing was studied. By using in-situ
measurements of X-ray photoelectron spectroscopy (XPS), it was found that great number of negatively charged particles (such as O^- and O^-₂) were adsorbed on the
surface. The amount of the adsorbed oxygen particles increased with the annealing temperature (T_ann), and then the adsorbed oxygen particles became less charged. The
increase in the number of the adsorbed oxygen particles is attributed to the transition from SnO_2 to Sn₂O₃ as T_ann≤350℃. At 350≤T_ann≤400℃,
the relative content of Sn in metallic Sn phase increased suddenly with T_ann due to the transition from Sn³⁺ to Sn^0, which resulted in releasing and successively piling up of O particles adsorbed on
the surface. Moreover, SnO₂ became more stable than Sn₂O₃ in the case of higher annealing temperauters, as say T_ann≤350℃. The adsorbed states of the oxygen
particles on the surface and the correlation between the adsorbed states and annealing temperature were also discussed.

Key words: oxidized Sn film, vacuum annealing, in-situ XPS measurements

中图分类号:

O484

严辉,马黎君,陈光华,黄世平,文华杰,郭伟民. 金属Sn氧化薄膜的真空退火与原位XPS测量[J]. 无机材料学报.

YAN Hui,MA Li-Jun,CHEN Guang-Hua,WONG Sei-Ping,MAN Wah-Kit,KWOK Wei-Man. Vacuum Annealing and in-Situ XPS Measurement of Oxidized Sn Films[J]. Journal of Inorganic Materials.

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