反应溅射NiCrOx薄膜过程及其光学性质的研究

无机材料学报

反应溅射NiCrO_x薄膜过程及其光学性质的研究

曹韫真; 胡行方

中国科学院上海硅酸盐研究所, 上海 200050

收稿日期:1999-04-07 修回日期:1999-05-15 出版日期:2000-04-20 网络出版日期:2000-04-20

Reactive Sputtering NiCrO_x Thin Film Process and Its Optical Constants

CAO Yun-Zhen; HU Xing-Fang

Shanghai Institute of Ceramics; Chinese Academy of Sciences; Shanghai 200050; Chind

Received:1999-04-07 Revised:1999-05-15 Published:2000-04-20 Online:2000-04-20

摘要/Abstract

摘要： 研究了反应气体流量对磁控反应溅射ＮｉＣｒＯ_ｘ薄膜成分和光学常数的影响．在反应溅射过程中，ＮｉＣｒ靶随着Ｏ_２流量的增大出现毒化现象．在不同氧流量条件下可沉积出近于透明的介电薄膜和不透明的吸收薄膜．对薄膜光学常数的研究可应用到太阳能光谱选择性吸收薄膜的制备．

关键词: 磁控反应溅射, NiCrO_x薄膜, 光学常数, 光谱选择性吸收表面

Abstract: The influence of mass flow of reactive gas on the composition and optical constants of deposited
NiCrO_x thin films was investigated. The results obtained show that NiCr target exhibits a poisoning phenomenon as O₂ flow rate
increased to a certain value during the reactive sputtering process. It is possible to deposit near transparent, dielectric thin films
as well as the non-transparent, absorbing thin films. The study of optical constants of the thin films deposited at different oxygen flow rate
may be applied to the development of solar selective surface.

Key words: magnetron reactive sputtering, NiCrO_x thin films, optical constants, solar selective surface

中图分类号:

O484

曹韫真,胡行方. 反应溅射NiCrO_x薄膜过程及其光学性质的研究[J]. 无机材料学报.

CAO Yun-Zhen,HU Xing-Fang. Reactive Sputtering NiCrO_x Thin Film Process and Its Optical Constants[J]. Journal of Inorganic Materials.

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