离子束增强沉积界面共混工艺对Cr-N镀层结合强度的影响

无机材料学报

离子束增强沉积界面共混工艺对Cr-N镀层结合强度的影响

唐宾¹; 李咏梅¹; 胡奈赛²

1. 太原理工大学表面工程研究所, 太原 030024; 2. 西安交通大学金属材料强度国家重点实验室, 西安 710049

收稿日期:1999-08-20 修回日期:1999-10-18 出版日期:2000-08-20 网络出版日期:2000-08-20

Effect of Intermixing Parameters on the Bonding Strength of IBED Cr-N Coatings

TANG Bin¹; LI Yong-Mei¹; HU Nai-Sai ²

1.Research Institute of Surface Engineering; Taiyuan University of Technology; Taiyuan 030024; China; 2.State Key Laboratory for Mechanical Behaviour of Materials; Xi an Jiaotong University; Xi an 710049; China

Received:1999-08-20 Revised:1999-10-18 Published:2000-08-20 Online:2000-08-20

摘要/Abstract

摘要： 采用连续压入法以及球滚接触疲劳法评定不同界面共混工艺所制Ｃｒ－Ｎ镀层膜基结合强度，并对两种方法试验结果进行分析对比．试验结果表明，在其它参数相同条件下，随着氮离子轰击能量从１０、２０ｋｅＶ提高到４０ｋｅＶ，动反冲共混界面结合强度则有明显降低的趋势，Ｐ_ｃ值测量值分别为６５０、７００、３３０Ｎ．当轰击能量为２０、１０ｋｅＶ时，Ｃｒ－Ｎ镀层在△Ｔ_ｒｚ＝４４２ＭＰａ时，循环疲劳周次达到５．０×１０^６时，镀层未剥落，表现出很高的动态结合强度，而４０ｋｅＶ动反冲共混界面在△Ｔ_ｒｚ＝４４２ＭＰａ时，循环疲劳周次仅为９．０×１０^５．较低能量（１０、２０ｋｅＶ）氮离子动态共混界面具有更理想的膜层一基体结合强度．两种方法测试结果具有一致性．当膜层－基体结合力较高时；压入法评定膜层－基体结合强度更简便、适用．

关键词: 离子束增强沉积, CrN, 膜层-基体结合强度

Abstract: The Cr-N coating/AISI52100 substrate bonding strength with different dynamic recoiling intermixing processes were evaluated by Rockwell-R
adhesion (P_c) and spherical rolling contact fatigue tests. The results show the coatings are of an excellent bonding strength
at low bombarding energy of 10keV and 20keV N ion dynamic recoiling intermixing. With bombarding energy increasing from 10keV and 20keV
to 40keV, the Rockwell-R adhesion (P_c) is 650N, 700N and 330N, and fatigue life (Δτ_rz=442MPa) decreases from 5.0×10⁶ to 9.0×10⁵. The results of P_c
and spherical rolling contact fatigue strength possess resemble tendency.

Key words: IBED, Cr-N, coating/substrate bonding strength

中图分类号:

O484

唐宾,李咏梅,胡奈赛. 离子束增强沉积界面共混工艺对Cr-N镀层结合强度的影响[J]. 无机材料学报.

TANG Bin,LI Yong-Mei,HU Nai-Sai. Effect of Intermixing Parameters on the Bonding Strength of IBED Cr-N Coatings[J]. Journal of Inorganic Materials.

参考文献

[1] Tamulevicius S, Pranevicius L. Surf. Coat. Technal., 1995, 71: 239--246.
[2] Qiu Yuanxun. Nuch. Instr. Meth., 1991, B56/57: 634--639.
[3] Kenji Sugiyama, Kazunori Hayashi, Jun Sasaki. Nuch. Instr. Meth., 1993, B80/81: 1367--1382.
[4] 唐宾, 刘道新, 胡奈赛, 等(TANG Bin, et al). 无机材料学报(Journal of Inorganic Materials), 1999, 14 (4): 593--600.
[5] Tang Bin, Zhu Xiaodong, He Jiawen. Trams. Nonferrous Met. Soc. China, 1999, 9 (4): 753--756.
[6] Heink W, Leyland A, Brosseit E. Thin solid films, 1995, 270: 431--437.
[7] Friedrich C, Berg G, Broszeit E, et al. Surf. Coat. Technal., 1995, 74-75: 279--285.
[8] 胡奈赛, 徐可为, 何家文. 中国表面工程, 1998, 38 (1): 31--36.
[9] Montmitonnet P, Edilinger M L, Felder E. Journal of Tribology, 1993, 115: 15--20.
[10] Montmitonnet P, Edilinger M L, Felder E. Journal of Tribology, 1993, 115: 1--15.
[11] Laugier M J. J. Mater. Sci., 1986, 21: 2269--2274.
[12] TANG Bin, ZHU Xiaodong, HU Naisai. Trans, Nonferrous Met. Soc. China, 2000, 10 (1): 64--68.
[13] Prasekara Chan C S, Rao A Ramamo. Wear, 1983, 87: 287--296.
[14] 高彩桥，刘家浚. 材料的粘着磨损与疲劳磨损. 北京：机械工业出版社，1989. 18.
[15] Ma Dejun, Xu Kewei, He Jiawen. Thin Solid Films, 1998, 323: 183--187.
[16] 机械工程材料性能数据手册. 北京：机械工业出版社, 1995. 312.
[17] Ziegler J F, Bierssack J B, Littmark U. The stopping and range of ions in solids. New York: Pergaman, 1985. 86.
[18] Wagner C D, Riggs W M, Davis L E. Handbook of X-ray Photoelectron Spectroscopy, Minnesota: Perkin-Elmer, 1979. 73.
[19] Mattox D M. J. Vac. Sci. Technol., 1989, A7 (3): 1105--1114.
[20] Nastasi M, Mayer J W. Materials Science and Engineering, 1994, R12 (1): 1--49.