无机材料学报

• 研究论文 • 上一篇    下一篇

Al2O3基板直接敷铜法的敷接机理研究

方志远; 周和平; 陈虎   

  1. 清华大学材料科学与工程系新型陶瓷与精细工艺国家重点实验室, 北京 100084
  • 收稿日期:1999-07-22 修回日期:1999-09-20 出版日期:2000-08-20 网络出版日期:2000-08-20

Bonding Mechanism of Direct Bond Copper to Alumina Substrate

FANG Zhi-Yuan; ZHOU He-Ping; CHEN Hu   

  1. State Key Laboratory of New Ceramics and Fine Processing; Department of Materials Science and Engineering; Tsinghua University Beijing 100084 China
  • Received:1999-07-22 Revised:1999-09-20 Published:2000-08-20 Online:2000-08-20

摘要: 本文采用直接敷铜工艺, 1070℃流动氮气氛下保温3h制得剥离强度达11.5Kg/cm的直接敷铜Al基板.界面产物CuAIO的形成是获得较高结合强度的关键.敷接温度下,在界面上产生了能很好润湿Al表面的Cu[O]共晶液体,并反应生成了连续的CuAIO层降温时,共晶液体从Cu侧开始固化并淀析出CuO颗粒.当固化前沿与CuAIO层相遇时,液相参与的界面反应停止.冷却至室温,即可获得Cu和Al基板之间的牢固结合.

关键词: 直接敷铜法, 剥离强度, 界面产物

Abstract: Cu-Cu2O eutectic bonding of copper to Al2O3 was investigated. The highest peel strength was 11.5kg/cm for the specimen prepared at 1070℃ for 3h in nitrogen atmosphere. Oxygen promoted the wetting between
copper and Al2O3 greatly. Cu[O] melt reacted with the alumina and formed a continuous CuAlO2 layer, which enhanced the peel strength of the joint. On
cooling, the solidification front moved from the solid copper towards alumina, and Cu2O precipitated from the Cu[O] melt. When the solidification front met
the CuAlO2 layer, liquid-aided reaction completed and a reliable bond was achieved between the copper and Al2O3 substrate.

Key words: direct bonded copper(DBC), peel strength, interfacial product

中图分类号: