无机材料学报 ›› 2026, Vol. 41 ›› Issue (3): 311-321.DOI: 10.15541/jim20250216 CSTR: 32189.14.jim20250216
朱飞1(
), 郝旭洁1, 张全贵1, 闫新越1, 刘洪飞1, 张博2, 李欣3, 刘德峰3, 妥雅勇1, 张守超1(
)
收稿日期:2025-05-19
修回日期:2025-07-01
出版日期:2025-07-16
网络出版日期:2025-07-16
通讯作者:
张守超, 教授. E-mail: zhshch@tcu.edu.cn作者简介:朱 飞(1983-), 男, 实验师. E-mail: zhufei2012@tcu.edu.cn
基金资助:
ZHU Fei1(
), HAO Xujie1, ZHANG Quangui1, YAN Xinyue1, LIU Hongfei1, ZHANG Bo2, LI Xin3, LIU Defeng3, TUO Yayong1, ZHANG Shouchao1(
)
Received:2025-05-19
Revised:2025-07-01
Published:2025-07-16
Online:2025-07-16
Contact:
ZHANG Shouchao, professor. E-mail: zhshch@tcu.edu.cnAbout author:ZHU Fei (1983-), male, engineer. E-mail: zhufei2012@tcu.edu.cn
Supported by:摘要:
碳化硅(SiC)是核反应堆结构的重要候选材料, 其辐照损伤行为与高温回复机制直接影响材料的服役性能与寿命。为阐明中子辐照对掺氮(氮掺杂浓度ND≈3.0×1019 cm-3)6H-SiC性能的影响及缺陷高温回复机制, 本研究系统探究了中子辐照(辐照温度约150 ℃, 辐照剂量2.58×1020 n/cm2)和等时退火过程中的缺陷演化与热力学行为。结合不同表征技术和第一性原理计算, 深入解析了材料结构与性能的演变规律, 主要结果如下。(1) 辐照引发晶格显著肿胀(a、c轴及晶胞体积V的肿胀率分别为0.416%、0.430%和1.310%), 晶体保持单晶结构。(2) 辐照使比热增加14.7%, 并在100~500 ℃升温过程中释放375.4 J/g的辐照储能。(3) 基于晶胞参数回复与拉曼光谱演化, 揭示了缺陷高温回复的四阶段动力学(室温(RT)~600 ℃阶段以C-Frenkel近距复合为主, 迁移能Ea=0.14 eV; 600~850 ℃阶段涉及Si-Frenkel复合及碳间隙原子迁移, Ea=0.26 eV; 850~1200 ℃阶段为空位迁移驱动的晶格重构, Ea=0.65 eV; 1200~1500 ℃阶段为碳空位(VC)长程扩散及NCVSi复合体解离, Ea=1.50 eV)。(4) 拉曼与荧光光谱结果确认氮掺杂形成NCVSi缺陷构型, 在785 nm激发下产生826 nm特征发光峰(对应634 cm-1拉曼位移)。本研究揭示了中子辐照6H-SiC的缺陷回复路径与迁移能, 阐明了其热力学响应与高温回复动力学机制, 为核用SiC材料的辐照损伤评估、性能预测及退火工艺优化提供了重要依据。
中图分类号:
朱飞, 郝旭洁, 张全贵, 闫新越, 刘洪飞, 张博, 李欣, 刘德峰, 妥雅勇, 张守超. 中子辐照6H-SiC热力学及辐照缺陷高温回复动力学[J]. 无机材料学报, 2026, 41(3): 311-321.
ZHU Fei, HAO Xujie, ZHANG Quangui, YAN Xinyue, LIU Hongfei, ZHANG Bo, LI Xin, LIU Defeng, TUO Yayong, ZHANG Shouchao. Irradiation Defects in Neutron-irradiated 6H-SiC: Thermodynamic and High-temperature Recovery Kinetics[J]. Journal of Inorganic Materials, 2026, 41(3): 311-321.
图1 (a, b) 6H-SiC晶胞参数和(c, d) (006)晶面衍射峰随退火温度的变化
Fig. 1 Variations of (a, b) 6H-SiC unit cell parameters and (c, d) (006) crystal plane diffraction peak with annealing temperature
图2 6H-SiC辐照损伤及退火回复的TEM照片与SAED图案
Fig. 2 TEM images and SAED patterns of 6H-SiC showing irradiation damage and annealing recovery (a) Unirradiated sample; (b) Irradiated sample; (c) 900 ℃ annealed sample after irradiation
图3 6H-SiC表面微观形貌SEM照片
Fig. 3 SEM images of 6H-SiC surface microstructures (a)Unirradiated sample; (b) Neutron-irradiated sample; (c-f) Annealed at (c) 600, (d) 900, (e) 1200 and (f) 1500 ℃
图5 辐照及不同温度退火后6H-SiC比热随温度的变化
Fig. 5 Temperature dependence of specific heat capacity for neutron-irradiated and annealed 6H-SiC at different temperatures (a) 100-300 ℃; (b) 600-1500 ℃
图7 6H-SiC的(a1, b1, c1, d1) C1s、(a2, b2, c2, d2) Si2p及(a3, b3, c3, d3) O1s XPS谱图
Fig. 7 (a1, b1, c1, d1) C1s, (a2, b2, c2, d2) Si2p and (a3, b3, c3, d3) O1s XPS spectra of 6H-SiC (a1-a3) Unirradiated; (b1-b3) Irradiated; (c1-c3) Annealed at 600 ℃; (d1-d3) Annealed at 1500 ℃. Colorful figures are available on website
图8 6H-SiC的Raman光谱随退火温度的变化
Fig. 8 Temperature-dependent evolution of Raman spectra of 6H-SiC (a) Unirradiated, neutron-irradiated, and annealed below 900 ℃; (b) Annealed at 900-1500 ℃
图9 6H-SiC本征缺陷态密度及缺陷发光机理示意图
Fig. 9 Schematic diagrams of intrinsic defect states density and defect-induced photoluminescence mechanism in 6H-SiC (a) Total density of states with different intrinsic defects; (b) Defect-induced photoluminescence mechanism
图10 300~1500 ℃等温退火6H-SiC晶胞体积的自然对数变化量(lnV-lnV0)随退火时间的变化
Fig. 10 Variation of the natural logarithm change in unit cell volume (lnV-lnV0) of 6H-SiC with annealing time during isothermal annealing at 300-1500 ℃
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