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无机材料学报

无机材料学报

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ZnO陶瓷靶制备及其薄膜 RF溅射工艺研究

陈祝1,2, 张树人2, 杜善义3, 杨成韬2, 郑泽渔2, 李波2, 孙明霞2   

  1. 1. 成都信息工程学院通信工程系, 成都 610225;
    2. 电子科技大学微电子与固体电子学院, 成都 610054;
    3. 哈尔滨工业大学复合材料研究所, 哈尔滨 150001
  • 收稿日期:2005-08-01 修回日期:2005-09-15 出版日期:2006-07-20 网络出版日期:2006-07-20

Li-doped ZnO Ceramic Target Preparation and RF Magnetron Sputtering ZnO Films

CHEN Zhu1,2, ZHANG Shu-Ren2, DU Shan-Yi3, YANG Cheng-Tao2, ZENG Ze-Yu2, LI Bo2, SUN Ming-Xia2   

  1. 1. Department of Telecommunication Engineering, Chengdu University of Information Technology, Chengdu 610225, China;
    2. School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;
    3. Center for Composite Materials. Harbin Institute of Technology, Harbin 150001, China
  • Received:2005-08-01 Revised:2005-09-15 Published:2006-07-20 Online:2006-07-20

PDF (PC)

1713

被引次数

16

摘要： 利用固相反应制备了直径为70mm, 厚度为10～15mm高质量掺杂Li2CO2的ZnO陶瓷靶材, 实验了不同摩尔浓度的Li+掺杂对靶材性能的影响, 确定了最佳Li+掺杂量为2.2mol%, 同时通过在不同温度烧结实验、不同成型压力实验确定了ZnO靶材制备的最佳工艺, 并采用所制备的ZnO-Li2.2%陶瓷靶和RF(射频磁控)技术在Si(100)、玻璃(载玻片)、及Pt(111)/Ti/SiO2/Si(100)基片上制备出高度c轴(002)择优取向的ZnO薄膜, 其绝缘电阻率ρ为4.12×108Ω·cm, 达到了声表面波器件(SAW)的使用要求.

关键词: 陶瓷靶, 氧化锌薄膜, 射频磁控溅射, 择优取向

Abstract: We successfully prepared high quality Li-doped ZnO ceramic targets with 70mm in diameter and 10～15mm in depth by solid-state reactions. The paper studied the influence of different concentration of Li2CO3 on the electrical properties of ZnO ceramic target. By comparing and analyzing the IR( insulative resistivity ) and tgδ(dielectric loss), the optimum concentration of Li2CO3 doped in ZnO ceramic target was obtained(2.2%mol ratio). And the optimum process for preparing ZnO-Li2.2% ceramic target was also realized through the investigation of physics and electrics of ZnO ceramic under the different sintering temperatures and molding pressure treatments. By using Li2.2%-doped ZnO ceramic as the target, the ZnO films with highly c-axis (002) preferred orientation were grown by RF magnetron sputtering on Si(100), glass and Pt(111)/Ti/SiO2/Si(100) substrates respectively.

Key words: ceramic target, zinc oxide films, RF magnetron sputtering, preferred orientation

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