MF(I)S结构设计对硅基铁电薄膜系统C-V特性的影响
于军,董晓敏,赵建洪,周文利,谢基凡,郑远开,刘刚
C-V Characteristics of Ferroelectric Thin Film Systems with MF(I)S Structures on Si
YU Jun,DONG Xiao-Min,ZHAO Jian-Hong,ZHOU Wen-Li,XIE Ji-Fan,ZHENG Yuan-Kai,LIU Gang
无机材料学报
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1999, (4): 613
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