离子源偏压对PIA-EB-Hf法制备的HfO2激光薄膜性能的影响
付朝丽, 杨 勇, 马云峰, 魏玉全, 焦 正, 黄政仁
APS Bias Voltage on Properties of HfO2 Laser Films Deposited by Reactive Plasma Ion Assisted Electron Evaporation
FU Chao-Li, YANG Yong, MA Yun-Feng, WEI Yu-Quan, JIAO Zheng, HUANG Zheng-Ren
无机材料学报
.
2017, (1): 69
-74
.
DOI: 10.15541/jim20160170
