PECVD下基底温度对SiC薄膜形态、成分及生长速度的影响
于方丽, 白 宇, 秦 毅, 岳 冬, 罗才军, 杨建锋
Influence of Substrate Temperature on the Morphology, Composition and Growth Rate of SiC Films Deposited by PECVD
YU Fang-Li, BAI YU, QIN Yi, YUE Dong, LUO Cai-Jun, YANG Jian-Feng
无机材料学报
.
2013, (2): 201
-206
.
DOI: 10.3724/SP.J.1077.2013.12203
