含氮体系CVD低压金刚石薄膜淀积条件

刘志杰,张卫,张剑云,万永中,王季陶

Deposition Conditions for CVD Diamond Films under Low Pressure with Nitrogen Addition

LIU Zhi-Jie,ZHANG Wei,ZHANG Jian-Yun,WAN Yong-Zhong,WANG Ji-Tan

无机材料学报 . 1999, (1): 114 -118 .