合成硼碳氮体系薄膜的XPS研究

无机材料学报

合成硼碳氮体系薄膜的XPS研究

雷明凯^1,2; 袁力江¹; 张仲麟¹; 马腾才²

1. 大连理工大学材料工程系, 大连 116024; 2. 大连理工大学三束材料改性国家重点联合实验室, 大连 116024

收稿日期:1998-10-09 修回日期:1999-01-04 出版日期:1999-08-20 网络出版日期:1999-08-20

XPS Studies of Synthesized B C N Films by Plasma Source Ion Nitriding

LEI Ming-Kai ^{1; 2}, YUAN Li-Jiang ¹ ,ZHANG Zhong-Lin ¹, MA Teng Cai ²

1. Department of Materials Engineering; Dalian University of Technology Dalian 116024 China; 2. National Laboratory of Materials Modification; Dalian University of Technology Dalian 116024 China

Received:1998-10-09 Revised:1999-01-04 Published:1999-08-20 Online:1999-08-20

摘要/Abstract

摘要： 采用Ｘ射线光电子谱（ＸＰＳ）分析３００～５００℃ 等离子体源离子渗氮硼和碳化硼薄膜合成的氮化硼和硼碳氮薄膜利用合成薄膜成分可控的特点，研究Ｂ、Ｃ、Ｎ对薄膜的ＸＰＳ影响结果表明，ＸＰＳ分析合成氮化硼薄膜能够确定其化学组成，但不能确定ｓｐ^２和ｓｐ^３型键合结构特性；ＸＰＳ分析硼碳氮薄膜能够确定其成分和结构特性在较高的工艺温度下，等离子体源离子渗氮合成的硼碳氮薄膜具有ｓｐ^２和ｓｐ^３型复合的键合结构

关键词: 硼碳氮薄膜, 等离子体源离子渗氮, X射线光电子谱

Abstract: The synthesized boron nitride and boron-carbon-nitrogen films by plasma source ion nitriding were analyzed by X-ray photoelectron spectroscopy
(XPS). The effects of boron, carbon and nitrogen elements in the films on the XPS results were studied making use of the film characteristics with the
controllable composition. The XPS revealed that the formation of boron nitride films was confirmed but the sp² and sp³ plain microdomain structures were difficult distinguished, and the formation and bonding structures of boron-carbon-nitrogen
films could be determined. The synthesized boron-carbon-nitrogen films possessed a mixing structure of sp² and sp³ plain microdomains
in the processes.

Key words: boron-carbon-nitrogen films, plasma source ion nitriding, X-ray photoelectron spectroscopy

中图分类号:

O484

雷明凯,袁力江,张仲麟,马腾才. 合成硼碳氮体系薄膜的XPS研究[J]. 无机材料学报.

LEI Ming-Kai,YUAN Li-Jiang ,ZHANG Zhong-Lin,MA Teng Cai. XPS Studies of Synthesized B C N Films by Plasma Source Ion Nitriding[J]. Journal of Inorganic Materials.