Aluminum-doped ZnO (ZnO:Al) films were prepared at room temperature in pure argon ambient on glass substrates by RF magnetron sputtering. The influence of sputtering power, deposition pressure and film thickness on the film properties was investigated. The deposited ZnO:Al films were characterized to examine the electrical, optical, and structural properties for the application of thin copper indium gallium selenide (CIGS) solar cells. The deposition parameters of ZnO:Al films were optimized. The optimized ZnO:Al films showed a strong and sharp (0 0 2) X-ray diffraction peak. The 600–800 nm thick ZnO–Al films showed a high transparency above 85% in the visible range and a sheet resistance low to 10 Ω/□. CIGS solar cells with 1.2 μm thick absorbers were fabricated using bi-layer ZnO films (low resistive and thick ZnO:Al/high resistive and transparent thin i-ZnO) as front contacts. The thin absorber layers were prepared by the low cost technique involving co-sputtering of Cu–Ga alloy and In targets and selenization with Se powders. Efficiencies of the order of 6–7% were achieved for the manufactured thin CIGS solar cells without antireflective films. The results demonstrated that RF sputtered ZnO:Al films are suitable for application in low cost and thin CIGS solar cells as transparent conductive electrode layers.

This study focuses on the implementation of different aluminum oxide coatings processed by metal-organic chemical vapor deposition from aluminum tri-isopropoxide on commercial Ti6Al4V titanium alloy to improve its high temperature corrosion resistance. Films grown at 350 °C and at 480 °C are amorphous and correspond to formulas AlOOH, and Al₂O₃, respectively. Those deposited at 700 °C are composed of γ-Al₂O₃ nanocrystals dispersed in a matrix of amorphous alumina. Their mechanical properties and adhesion to the substrates were investigated by indentation, scratch and micro tensile tests. Hardness and rigidity of the films increase with increasing deposition temperature. The hardness of the coatings prepared at 350 °C and 480 °C is 5.8 ± 0.7 GPa and 10.8 ± 0.8 GPa respectively. Their Young's modulus is 92 ± 8 GPa (350 °C) and 155 ± 6 GPa (480 °C). Scratch tests cause adhesive failures of the films grown at 350 °C and 480 °C whereas cohesive failure is observed for the nanocrystalline one, grown at 700 °C. Micro tensile tests show a more progressive cracking of the latter films than on the amorphous ones. The films allow maintaining good mechanical properties after corrosion with NaCl deposit during 100 h at 450 °C. After corrosion test only the film deposited at 700 °C yields an elongation at break comparable to that of the as processed samples without corrosion. The as established processing–structure–properties relation paves the way to engineer MOCVD aluminum oxide complex coatings which meet the specifications of the high temperature corrosion protection of titanium alloys with regard to the targeted applications.

Abstract

PEO coatings were produced on AM50 magnesium alloy by plasma electrolytic oxidation process in silicate and phosphate based electrolytes using a pulsed DC power source. The microstructure and composition of the PEO coatings were analyzed by scanning electron microscopy (SEM) and X-ray Diffraction (XRD). The corrosion resistance of the PEO coatings was evaluated using open circuit potential (OCP) measurements, potentiodynamic polarisation tests and electrochemical impedance spectroscopy (EIS) in 0.1 M NaCl solution. It was found that the electrolyte composition has a significant effect on the coating evolution and on the resulting coating characteristics, such as microstructure, composition, coating thickness, roughness and thus on the corrosion behaviour. The corrosion resistance of the PEO coating formed in silicate electrolyte was found to be superior to that formed in phosphate electrolyte in both the short-term and long-term electrochemical corrosion tests.

Abstract

The initial stages of oxide growth on titanium are examined in a recently developed commercial alkaline pyrophosphate/aluminate electrolyte of interest for plasma electrolytic oxidation of light metal alloys. Constant current anodizing was employed, with resultant films examined by scanning and transmission electron microscopies and Rutherford backscattering spectroscopy. The initial film is relatively uniform and composed of TiO₂, with low concentrations of aluminium and phosphorus species incorporated from the electrolyte. With increase in voltage the film breaks down locally, and regions of original and modified film develop simultaneously, with the latter occupying more of the surface as the voltage rises. Porous regions due to dielectric breakdown also become increasingly evident. At ∼240 V, sparking commences, and the surface reveals extensive, relatively uniform porosity, with the coating now containing much enhanced concentrations of aluminium and phosphorus species compared with the coating at lower voltages. The films develop at low efficiency due to generation of oxygen. The oxygen is produced within the original film material and at sites of dielectric breakdown. The former type of film develops a two-layered morphology, with an outer layer of amorphous TiO₂ and an inner layer with numerous fine and course cavities. The cavities are due to the generation of oxygen that may be associated with the formation of anatase in the inner layer.