氧化物双介质层忆阻器的设计及应用
游钧淇, 李策, 杨栋梁, 孙林锋

Double Dielectric Layer Metal-oxide Memristor: Design and Applications
YOU Junqi, LI Ce, YANG Dongliang, SUN Linfeng
图4 基于氧空位梯度的氧化物双介质层器件的两种机制和性能对比
Fig. 4 Two mechanisms and characteristics comparison of the double dielectric layer metal-oxide memristor based on oxygen vacancy gradient
(a, b) Schematic diagrams of the resistance switching mechanism with (a) the structure of W/AlOx/AlOy/Pt memristor[47], (b) Ti/HfO2/TiOx/Pt memristor[23]; (c, d) Endurance of W/AlOx/AlOy/Pt memristor[47] and Ti/HfO2/TiOx/Pt memristor[23], and the Ti/HfO2/TiOx/Pt memristor with transition layer exhibiting more stable resistance states