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氧化物双介质层忆阻器的设计及应用
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游钧淇 1(  ), 李策 1, 杨栋梁 1, 孙林锋 1,2(  )
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Double Dielectric Layer Metal-oxide Memristor: Design and Applications
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YOU Junqi 1(  ), LI Ce 1, YANG Dongliang 1, SUN Linfeng 1,2(  )
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图1. 氧化物双介质层忆阻器与氧化物单介质层忆阻器的结构和性能对比
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Fig. 1. Comparison of the structure and performance between the single/double dielectric layer metal-oxide memristor (a, d) Schematic diagrams for (a) single and (d) double dielectric layer metal-oxide memristors; (b, e) Comparison of I-V curves between (b) ZrO2-based memristor and (e) Ta2O5/ZrO2-based memristor with bi-layer structure exhibiting more uniform switching voltage[17]; (c, f) Comparison of the endurance between (c) HfO2-based memristor and (f) HfO2:Al/HfO2-based memristor with double dielectric layer exhibiting better cycling endurance[18]
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