等离子体聚集装置下的高能量密度单晶金刚石快速生长研究 |
李一村, 刘雪冬, 郝晓斌, 代兵, 吕继磊, 朱嘉琦 |
Rapid Growth of Single Crystal Diamond at High Energy Density by Plasma Focusing |
LI Yicun, LIU Xuedong, HAO Xiaobin, DAI Bing, LYU Jilei, ZHU Jiaqi |
图3 不同功率-气压条件下的等离子体核Hα(656 nm)谱线强度 |
Fig. 3 Hα (656 nm) intensity of plasma under different power and pressure conditions Data points in the horizontal axis represent different power-pressure parameters. Data point 1 is the initial parameter (900 W-5 kPa), and then the power and pressure of each data point increase by 200 W and 1 kPa successively until the final growth conditions (3500 W-18 kPa) |
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