图5 在不同表面处理的Si片生长ZnO纳米棒的表面和断面SEM照片 Fig. 5 The surface morphology and cross-sectional SEM images of the Si substrates after different surface treatments a, a#cod#x02032;, a#cod#x02032;#cod#x02032; The Si substrate was first etched by TMAH for 20 min and then ZnO nanorods were grown on it; b, b#cod#x02032;, b#cod#x02032;#cod#x02032; The Si substrate was first etched by TMAH for 40 min and then ZnO nanorods were grown on it and c ZnO nanorods were grown on the unetched Si substrate |