靶成分和溅射参数对碳化钒薄膜微结构与力学性能的影响

沈洁, 李冠群, 李玉阁, 李戈扬

Effect of Target Composition and Sputtering Parameters on Microstructure and Mechanical Properties of Vanadium Carbide Films

SHEN Jie, LI Guan-Qun, LI Yu-Ge, LI Ge-Yang

图6 VC-#cod#x02160;薄膜 P Ar =2.4 Pa和VC-#cod#x02161;薄膜 P Ar =1.2 Pa硬度随基片温度的变化
Fig. 6 Hardness of VC-#cod#x02160;films P Ar =2.4 Pa and VC-#cod#x02161;films P Ar =1.2 Pa sputtering at different substrate temperatures