靶成分和溅射参数对碳化钒薄膜微结构与力学性能的影响

沈洁, 李冠群, 李玉阁, 李戈扬

Effect of Target Composition and Sputtering Parameters on Microstructure and Mechanical Properties of Vanadium Carbide Films

SHEN Jie, LI Guan-Qun, LI Yu-Ge, LI Ge-Yang

图5 不同基片温度下VC-#cod#x02160;薄膜 P Ar =2.4 Pa的XRD图谱
Fig. 5 XRD patterns of VC-#cod#x02160;films P Ar =2.4 Pa sputtering at different substrate temperatures