靶成分和溅射参数对碳化钒薄膜微结构与力学性能的影响
, 李冠群, 李玉阁, 李戈扬 Effect of Target Composition and Sputtering Parameters on Microstructure and Mechanical Properties of Vanadium Carbide Films
SHEN Jie, LI Guan-Qun, LI Yu-Ge, LI Ge-Yang
, LI Guan-Qun, LI Yu-Ge, LI Ge-Yang Fig. 3 Cross-sectional SEM images of VC-#cod#x02160; films sputtering at different Ar pressures a P Ar =0.32 Pa; b P Ar =3.2 Pa; c P Ar =4.0 Pa
