靶成分和溅射参数对碳化钒薄膜微结构与力学性能的影响

沈洁, 李冠群, 李玉阁, 李戈扬

Effect of Target Composition and Sputtering Parameters on Microstructure and Mechanical Properties of Vanadium Carbide Films

SHEN Jie, LI Guan-Qun, LI Yu-Ge, LI Ge-Yang

图2 不同Ar气压下VC-#cod#x02160;薄膜和VC-#cod#x02161;薄膜的XRD图谱
Fig. 2 XRD patterns of VC-#cod#x02160; a and VC-#cod#x02161;b films sputtering at different Ar pressures Substrate temperature, VC-#cod#x02160;: 450℃, VC-#cod#x02161;: 300℃