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ISSN:1000-324X CN:31-1363/TQ
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Journal of Inorganic Materials
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中文
Low-temperature Deposition of
α
-Al
2
O
3
Films by Reactive Sputtering Al+
α
-Al
2
O
3
Target
CHENG Yi-Tian, QIU Wan-Qi, ZHOU Ke-Song, LIU Zhong-Wu, JIAO Dong-Ling, ZHONG Xi-Chun, ZHANG Hui
Journal of Inorganic Materials . 2019, (
8
): 862 -866 . DOI: 10.15541/jim20180473
