Effects of HfO2 Interlayer on Microstructure and Mechanical Property of Al2O3 Thin Film on MgF2 Substrate

doi:10.15541/jim20160030

Abstract

Abstract:

Al₂O₃ thin films with or without HfO₂ interlayer between Al₂O₃ and substrate were deposited on MgF₂ substrates by electron-beam evaporation technique. The as-deposited thin films were then annealed at 600℃ for 1 h to promote crystallization. The microstructure, IR transmittance and mechanical properties of the as-deposited and annealed samples were investigated by field emission scanning electron microscopy (FE-SEM), grazing incidence X-ray diffraction (GIXRD), Fourier Transform Infrared (FTIR) spectrometer, nanoindentation, and scratch tests, respectively. FE-SEM results show that a new branch-like layer is generated in annealed HfO₂/Al₂O₃double-layer thin films. The hardness of the newly formed layer is considered to be larger than 17.5 GPa. Because of the high hardness of the new layer, the MgF₂substrate can be protected from being drown out during scratch test. From GIXRD patterns, Al₂O₃ still remains amorphous while HfO₂ interlayer transforms from amorphous to monoclinic phase after annealing process. It could be deduced that it is the phase transformation of HfO₂ interlayer that promotes the formation of the harder branch-like layer.

Key words: HfO2 interlayer, Al2O3 thin film, microstructure, mechanical properties, MgF2 substrate

CLC Number:

TQ174

SONG Bo, ZHAO Li-Li, CHEN Xiao-Ying, YOU Li-Jun, SONG Li-Xin. Effects of HfO₂ Interlayer on Microstructure and Mechanical Property of Al₂O₃ Thin Film on MgF₂ Substrate[J]. Journal of Inorganic Materials, 2016, 31(7): 779-784.

Figures/Tables 5

Fig. 1 GIXRD patterns of the as-deposited and annealed samples

Fig. 2 Cross-sectional FE-SEM images of the as-deposited and annealed samples (a) A1; (b) A2; (c) AH1; (d) AH2

Fig. 3 IR transmittance spectra of the uncoated MgF2, as-deposited and annealed samples in the range of 3-5 μm

Fig. 4 Mechanical properties obtained from nanoindentation tests (a) Elastic modulus as a function of penetration depth for as-deposited and annealed samples; (b) Hardness as a function of penetration depth for the same samples

Fig. 5 SEM images of scratch tracks of the as-deposited and annealed samples.(a) A1; (b) A2; (c)AH1; (d) AH2; (e) Higher resolution image of the selected area in Fig. 5(d)

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Effects of HfO₂ Interlayer on Microstructure and Mechanical Property of Al₂O₃ Thin Film on MgF₂ Substrate

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